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SEMI E29-93 © SEMI 1993, 2004 1 SEMI E29-93 (Reapproved 1104) STANDARD TERMINOLOGY FOR THE CALIBRATION OF MASS FLOW CONTROLLERS AND MA SS FLOW METERS This standard was technically approved b y the Global Gases Committee …

SEMI E28-92 © SEMI 1992, 2004 4

5.5.1.1 Example — Pressure coefficient of span may

be expressed as:

0.1% of reading

240 kPa - 220 kPa



0.005% of reading/kPa with N

NOTE 9: If the relation between gas pressure and change in

output is linear, one coefficient will suffice.

5.5.2 If the gas pressure influence is non-linear, a

different method of expression may be used. Two

examples:

5.5.2.1 The percent of span change in output will not

exceed a specified value for any value of gas pressure

within a specified pressure range of a particular gas.

5.5.2.1.1 Example — “± 0.1% of reading maximum

error over 200 kPa to 250 kPa with Nitrogen”

5.5.2.2 It may be desirable to state a series of

coefficients for successive increments of gas pressure

within a specified pressure range.

NOTICE: SEMI makes no warranties or

representations as to the suitability of the standards set

forth herein for any particular application. The

determination of the suitability of the standard is solely

the responsibility of the user. Users are cautioned to

refer to manufacturer's instructions, product labels,

product data sheets, and other relevant literature,

respecting any materials or equipment mentioned

herein. These standards are subject to change without

notice.

By publication of this standard, Semiconductor

Equipment and Materials International (SEMI) takes no

position respecting the validity of any patent rights or

copyrights asserted in connection with any items

mentioned in this standard. Users of this standard are

expressly advised that determination of any such patent

rights or copyrights, and the risk of infringement of

such rights are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI E29-93 © SEMI 1993, 2004 1

SEMI E29-93 (Reapproved 1104)

STANDARD TERMINOLOGY FOR THE CALIBRATION OF MASS FLOW

CONTROLLERS AND MASS FLOW METERS

This standard was technically approved by the Global Gases Committee and is the direct responsibility of the

North American Gases Committee. Current edition approved by the North American Regional Standards

Committee on July 11, 2004. Initially available at www.semi.org September 2004; to be published

November 2004. Originally published in 1993; last published February 1999.

1 Purpose

1.1 This standard defines terms commonly used in the

calibration of mass flow controllers (MFC) and mass

flow meters (MFM). It is intended to provide for

worldwide terminology to be used by manufacturers

and users.

2 Scope

2.1 This standard defines terminology related to

MFC/MFM calibration. At present, there are often

several words used by the semiconductor industry to

describe the same concept or device. This standard is

intended to eliminate confusion and provide for a

common language which users and manufacturers can

employ to discuss MFC/MFM calibration.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

3 Limitations

3.1 This standard attempts to provide basic definitions.

In some instances, it may be impossible to provide

definitions which thoroughly explain a concept. It is

suggested, in such instances, that the user consult other

sources or SEMI standards related to this topic.

4 Referenced Standards

4.1 SEMI Standards

SEMI E12 — Standard for Standard Pressure and

Standard Temperature for Flow Units Used in Mass

Flow Meters and Mass Flow Controllers

SEMI E18 — Guideline for Temperature Specifications

of the Mass Flow Controller

SEMI E28 — Guideline for Pressure Specifications of

the Mass Flow Controller

NOTICE: Unless otherwise indicated, all documents

cited shall be the latest published versions.

5 Terminology

5.1 Definitions

5.1.1 attitude — for mass flow controllers and mass

flow meters, the relationship between the base

mounting plane of the MFC, the gas flow direction and

the gravity vector. It may be stated as horizontal (base

down), vertical (inlet up), vertical (inlet down),

horizontal (upside down), or horizontal (either side

down).

5.1.2 calibration gas — for mass flow controllers and

mass flow meters, the gas which is flowed while the

device is being calibrated.

5.1.3 calibration temperature — for mass flow

controllers and mass flow meters, the ambient

temperature at which the device is calibrated. (SEMI

E18)

5.1.4 mass flow controller (MFC) — a self-contained

device, consisting of a mass flow transducer, control

valve, and control and signal-processing electronics,

commonly used in the semiconductor industry to

measure and regulate the mass flow of gas.

5.1.5 mass flow meter (MFM) — a self-contained

device, consisting of a mass flow transducer and signal-

processing electronics, commonly used in the

semiconductor industry to measure the mass flow of

gas.

5.1.6 molar flow — the number of moles per unit of

time flowing in a closed channel.

5.1.7 nameplate gas — for mass flow controllers and

mass flow meters, the gas, as labeled on the product,

intended to be controlled or measured.

5.1.8 primary flow standard — a device or system

which measures flow using a method based on some or

all of the primary measurements of length, time,

temperature, volume, pressure, or mass.

5.1.9 process gas — for mass flow controllers and

mass flow meters, the principal gas which the user

requires the device to control or measure.

5.1.10 standard pressure — the pressure in pascals

specified as a reference for measurement and

comparison. It is defined for use in the semiconductor

industry as 101.32 kilo pascals (760 torr).

5.1.11 standard temperature — the temperature, in

degrees Celsius, specified as a reference for

measurement and comparison. It is defined for use in

semiconductor industry as 0.0°C.

5.1.12 standard volumetric flow — for mass flow

controllers and mass flow meters, the calculated

volumetric flow, at standard temperature and pressure,

of gas in a closed fluid channel. Volume at standard

temperature and pressure assumes the ideal gas law,

PV = nRT. Units of standard volumetric flow are

commonly used to express mass flow in mass flow

controllers and mass flow meters.

5.1.13 surrogate gas — for mass flow controllers and

mass flow meters, a gas intended to simulate the

calibration characteristics of another gas.

5.1.14 transfer standard — for mass flow controllers

and mass flow meters, a device typically calibrated

against a primary standard which can guarantee

sufficient accuracy to, in turn, calibrate another device.

5.1.15 warm-up time — for mass flow controllers and

mass flow meters, the time required, after going from

an unpowered to a powered state, for the device to

achieve sufficient electrical and thermal stability such

that rated performance specifications can be met.