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SEMI P10-0705 © SEMI 1990, 2005 138 8.1.526 PRO DUCT_IMAGING_TYPE — (BINARY, AA PSM, EAPSM, COMPLIMENTARY, BINARY_TRIM, or EUV) 8.1.527 PRODUCT_MAGNIFIC ATION — (10X, 5X, 4X, 2.5X, 2X, 1.25 X, 1X, 0.8X) Fact or by which …

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SEMI P10-0705 © SEMI 1990, 2005 137
8.1.506 PHASE_ANGLE_RANGE — Maximum acceptable variation (in degrees) of phase shift measurements,
relative to each other.
8.1.507 PHASE_ANGLE_REFERENCE_ONLY — (T or F) If T, indicates that the phase angle feature is to be
measured and the data transmitted to the customer (if requested by SHIP_PHASE_SHIFT_MEASUREMENTS), but
that deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.508 PHASE_ANGLE_SITE_ID — Unique alphanumeric identifier of each phase angle measurement location
within MASK_SET_ID to identify individual locations when using <mask_results>. If the same coordinates apply
to locations on different masks within the mask set, they may have the same PHASE_ANGLE_SITE_ID, but it is
not mandatory.
8.1.509 PHASE_ANGLE_TARGET — The required phase shift in degrees at the specified PSM_WAVELENGTH.
8.1.510 PHASE_ANGLE_TOLERANCE — The maximum acceptable deviation of the mean of all phase shift
measurements (in degrees) to the PHASE_ANGLE_TARGET.
8.1.511 PHASE_SHIFT_QUALITY_ID — (text) Customer’s label for a collection of phase shift quality
specifications, to be used only in addition to explicit quality requirement keywords. This may be used in the data
structure in addition to, but not in place of, explicit quality requirement keywords. This may not be used in
combination with QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality
grade before using it in SEMI P10.
8.1.512 PLACEMENT_TOP_CELL — Name of CELL_ID which defines all pattern place-ments for this
MASK_GROUP_ID. This referenced cell is centered on the mask.
8.1.513 PLOT_FORMAT — (GIF, JPG, PNG, FAX, PAPER) Medium for delivery of plot.
8.1.514 PLOT_SCALE — Numeric scale of plot or map.
8.1.515 PLOT_TYPE — (JOB_DATA, ARRAY, PATTERN, BARCODE) Requires delivery of the plot to the
customer. JOB_DATA requires delivering a plot of the entire patterned area of the mask, including the image of the
pattern file data. ARRAY requires an array map to be sent showing only an outline of each pattern and not showing
the image content of any pattern. PATTERN requires delivering a plot of the pattern at the scale and tone indicated.
BARCODE requires delivering a plot of the pattern created by <barcode_data>. PATTERN is the only value
permitted under <pattern_options>. The other types are permitted only under <shippable_data>.
8.1.516 PO_NUMBER — Alphanumeric purchase order number.
8.1.517 POST_PELL_INSPECTION_DATE_AND_TIME — Date and time of the final qualifying inspection run
after applying the pellicle.
8.1.518 POST_PELL_INSPECTION_ID — Identification (or serial number) assigned by the inspection tool for the
final qualifying inspection run after applying the pellicle.
8.1.519 PRE_PELL_INSPECTION_DATE_AND_TIME — Date and time of the final qualifying inspection run
prior to applying the pellicle.
8.1.520 PRE_PELL_INSPECTION_ID — Identification (or serial number) assigned by the inspection tool for the
final qualifying inspection run prior to applying the pellicle.
8.1.521 PRICE — Price (excluding freight and taxes) for preceding item (e.g., mask, pellicle, plot, database
inspection).
8.1.522 PRICE_UNITS — (3-character alphabetic currency code as listed in ISO 4217) Monetary unit used in all
references to PRICE with the <mask_set>.
8.1.523 PROCESS — (text) Name of the special process to be used in making the masks.
8.1.524 PROCESS_ETCHING_TYPE — (DRY or WET) Etching process to be used in making the masks.
8.1.525 PRODUCT_AS_CHECKPLATE — (T or F) If T, product mask is to be used for check-plate approval prior
to making other product masks.
SEMI P10-0705 © SEMI 1990, 2005 138
8.1.526 PRODUCT_IMAGING_TYPE — (BINARY, AAPSM, EAPSM, COMPLIMENTARY, BINARY_TRIM,
or EUV)
8.1.527 PRODUCT_MAGNIFICATION — (10X, 5X, 4X, 2.5X, 2X, 1.25X, 1X, 0.8X) Factor by which the
exposure tool will reduce the image on the photomask (reticle) to form the image on the wafer.
8.1.528 PRODUCT_TYPE — (1X_FULL_FIELD, 1X_STD_FIELD_RETICLE, 1X_WIDE_FIELD_RETICLE,
RETICLE, CONTACT, SUBMASTER, CHECKPLATE, PROBE_PLATE, REPELLICLIZE and REINSPECT).
8.1.529 PSM_WAVELENGTH — Wavelength in nanometers to be used for <phase_shift> measurements. This
keyword may appear in addition to AIM_WAVELENGTH for a single MASK_ID, though the values of the two
should usually be the same.
8.1.530 PTC_FIXED — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value is expressed as a fixed monetary amount and is mutually exclusive with
PTC_RATE.
8.1.531 PTC_HOURS — (numeric) The number of hours from a given mask’s start date time (as negotiated
between the customer and vendor) within which the mask must be shipped to qualify for the Premium Time Charge
(PTC) specified in either PTC_RATE or PTC_FIXED. Multiple instances allow configuration of different charge
rates for different levels of performance, for example: 100 % for 12 hr turn, 75 % for 18 hr turn, 50 % for 24 hr turn.
8.1.532 PTC_RATE — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value represents the percentage of the total mask price (excluding
EWT_THRESHOLD hours) and is mutually exclusive with PTC_FIXED.
8.1.533 QS9000 — (T or F) If T, requires QS9000 control. Customer and vendor should agree on the methods and
control details before using this item.
8.1.534 QUALITY_GROUP_ID — (text) Customer’s label for a collection of mask quality specifications, to be
used only in addition to explicit quality requirement keywords. This may be used in the data structure in addition to,
but not in place of, explicit quality requirement keywords. Customer and vendor should document the meaning of
this quality grade before using it in SEMI P10.
8.1.535 QUANTITY — Integer number of array plots, pattern plots and films. May also apply to masks only when
PRODUCT_TYPE is contact masks.
8.1.536 QUOTE_NUMBER — Vendor’s quotation number to be referenced in billing documents.
8.1.537 REGISTR_ALGORITHM — (ONE-POINT, TWO-POINT or MULTI-POINT, x1,y1,x2,y2) Specifies the
method for analyzing registration reference marks. For ONE-POINT analysis, (x1,y1) is the fixed point and (x2,y2)
is used for angular orientation only. For TWO-POINT analysis, (x1,y1) and (x2,y2) are both used for angular
orientation and the fixed reference point is midway between the two. If MULTI-POINT is followed in the data field
by no specific points, then MULTI-POINT is the fit of all measured points resulting in zero mean error in x and zero
mean error in y. If MULTI-POINT is followed in the data field by a collection of three or more specific points, then
MULTI-POINT is the fit of all the specific points resulting in zero mean error in x and zero mean error in y for those
points. All of these points are relative to the nominal center of the mask.
8.1.538 REGISTR_ALGORITHM_USED — The method used for analyzing registration reference marks in the
registration measurements.
8.1.539 REGISTR_CLOSURE — Maximum allowable positional error between patterns written at the beginning of
writing the mask and the end of writing the mask, to be measured in both x and y axes.
8.1.540 REGISTR_CLOSURE_BEGIN — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the
beginning of writing the mask for REGISTR_CLOSURE measurement.
8.1.541 REGISTR_CLOSURE_END — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the end
of writing the mask for REGISTR_CLOSURE measurement.
8.1.542 REGISTR_CLOSURE_EQUIP_REQD — Alphanumeric identification of acceptable equipment for closure
measurement.
8.1.543 REGISTR_CLOSURE_EQUIP_USED — Closure measurement equipment used.
SEMI P10-0705 © SEMI 1990, 2005 139
8.1.544 REGISTR_CLOSURE_REFERENCE_ONLY — (T or F) If T, indicates that the closure measurements are
to be measured and the data transmitted to the customer (if requested by SHIP_CLOSURE_DATA), but that
deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.545 REGISTR_COMPENSATION_TEMPERATURE — Temperature in Celsius of the mask at the time
registration measurement data is to be collected.
8.1.546 REGISTR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for measuring
REGISTR_ERROR and REGISTR_ORTHO.
8.1.547 REGISTR_EQUIP_USED — Registration measurement equipment used.
8.1.548 REGISTR_ERROR — Maximum allowable registration error, relative to the REGISTR_REF_MASK_ID
or the reference grid of REGISTR_EQUIP_REQD. The mask must be rejected if the deviation in either X or Y of
any measured registration mark exceeds REGISTR_ERROR.
8.1.549 REGISTR_MARK_COUNT — (x,y) For a rectangular array of registration marks, the number of rows (x)
and columns (y).
8.1.550 REGISTR_MARK_DRAWING — The uniquely identified (for each customer) document which shows the
registration mark structure itself, and may show the place(s) within the registration mark which are to be measured.
8.1.551 REGISTR_MARK_FEATURE — Text describing the feature to be used for registration measurement.
8.1.552 REGISTR_MARK_ID — Unique alphanumeric identifier of each registration mark location within
MASK_SET_ID to identify individual registration measurements when using <mask_results>. If the same
coordinates apply to locations on different masks within the mask set, they may have the same
REGISTR_MARK_ID, but it is not mandatory. If REGISTR_MARK_ID is used with a CELL_REGISTR_MARK,
it will be associated with as many mask locations as the cell has instances. (See
MEASURED_REGISTR_MARK_ID for more information.) REGISTR_MARK_ID may only be used immediately
preceding either MASK_REGISTR_MARK or CELL_REGISTR_MARK.
8.1.553 REGISTR_MARK_LOCATION_DRAWING — The uniquely identified (for each customer) document
which shows the location(s) of the registration mark structure.
8.1.554 REGISTR_MARK_SEPARATION — (x, y) For an array of registration marks, the spacing between
successive marks in the horizontal (x) and vertical (y) directions.
8.1.555 REGISTR_MEASUREMENT_DATE — Date registration measurement was performed.
8.1.556 REGISTR_ORTHO — Maximum allowable non-orthogonality, in micro-radians, relative to the
REGISTR_REF_MASK_ID or the reference grid of REGISTR_EQUIP_REQD.
8.1.557 REGISTR_ORTHO_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_ORTHO is to be
measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.558 REGISTR_QUALITY_ID — (text) Customer’s label for a collection of registration quality specifications,
to be used only in addition to explicit quality requirement keywords. This may be used in the data structure in
addition to, but not in place of, explicit quality requirement keywords. This may not be used
in combination with
QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality grade before using it in
SEMI P10.
8.1.559 REGISTR_REF_MASK_ID — MASK_ID of the reference mask for determining REGISTR_ERROR and
REGISTR_ORTHO. If multiple masks are identified, the reference grid should be based on the mean of the
measurements of the group of masks.
8.1.560 REGISTR_REF_MASK_NAME — To be used in place of REGISTR_REF_MASK_ID only to refer to
those mask sets which were built outside the SEMI order standard and have no MASK_ID.
8.1.561 REGISTR_REF_MASK_SET_ID — MASK_SET_ID for the mask set containing
REGISTR_REF_MASK_ID for determining REGISTR_ERROR and REGISTR_ORTHO.