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SEMI F46-0999 © SEMI 1999 1 SEMI F46-0999 GUIDE FOR ON-SITE CHE MICAL GENERATION (OSCG) SYSTEMS This g u ide w as technica ll y a pproved by the Global Facilitie s Committee and is t he direct responsibility of the North…
SEMI F45-0699 © SEMI 19993
Figure 5B
Marking Application Example
7 Outside Diameter Toleran ce
7.1 The Outside Diameter tolerance of 6.35 mm (1/4
in.), 9.53 mm (3/8 in.) and 12.7 mm (1/2 in.) is + 0.1
mm, - 0.0 mm (+ 0.004 in., - 0.000 in.).
8 Wall Thickness of Tube E nd
8.1 Wall thickness of tube end should be either 1 mm
(0.039 inch) or 0.89 mm (0.035 inch), 1.24 mm (0.049
inch) and the thickness should be marked on the
reducing weld fitting body or its package. Wall
thickness tolerance is ± 8%.
Table 1 Dimensions and Tolerance
Nominal Diameter d d1 A B C D
9.53 × 6.35
(3/8 × 1/4)
9.53
(0.375)
6.35
(0.25)
6.35 + 0.1/ - 0.05
(0.25 + 0.004/ - 0.002)
11.9 ± 0.1
(0.4685 ± 0.004)
23.8 ± 0.1
(0.937 ± 0.004)
17.45 ± 0.1
(0.687 ± 0.004)
12.7 × 6.35
(1/2 × 1/4)
12.7
(0.5)
6.35
(0.25)
6.35 + 0.1/ - 0.05
(0.25 + 0.004/ - 0.002)
13.5 ± 0.1
(0.5315 ± 0.004)
27.0 ± 0.1
(1.063 ± 0.004)
20.65 ± 0.1
(0.813 ± 0.004)
12.7 × 9.53
(1/2 × 3/8)
12.7
(0.5)
9.53
(0.375)
6.35 + 0.1/ - 0.05
(0.25 + 0.004/ - 0.002)
13.5 ± 0.1
(0.5315 ± 0.004)
27.0 ± 0.1
(1.063 ± 0.004)
20.65 ± 0.1
(0.813 ± 0.004)
Dimensions: mm (in.)
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer's
instructions, product labels, product data sheets, and
other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
The user's attention is called to the possibility that com-
pliance with this standard may require use of copy-
righted material or of an invention covered by patent
rights. By publication of this standard, SEMI takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any item men-
tioned in this standard. Users of this standard are ex-
pressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
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the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI F46-0999 © SEMI 19991
SEMI F46-0999
GUIDE FOR ON-SITE CHEMICAL GENERATION (OSCG) SYSTEMS
This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the
North American Facilities Committee. Current edition approved by the North American Regional Standards
Committee on April 15, 1999. Initially available on www.semi.org August 1999; to be published September
1999.
1 Purpose
1.1 This guide establishes the minimum System and
Overall Implementation requirements for requirement
of On-Site Chemical Generation (OSCG) used in
semiconductor manufacturing. It is also intended to
establish a common basis for developing detailed
guides in subsequent documents concerning design,
performance, and certification of OSCG systems.
2 Scope
2.1 This guide applies to the OSCG system design
used for the generation of chemicals, particularly ultra
high purity, used in the silicon wafer, integrated circuit,
and/or substrate manufacturing processes. These will
include, but are not limited to, various concentrations of
NH
4
OH, HCl, HF, and NH
4
F aqueous solutions.
2.2 This standard does not purport to address all of the
safety issues associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicablity of regulatory limitations prior to use.
3 Limitations
3.1 This guide is not intended to cover all chemicals
used in these processes but only to those that can be
generated, on-site, by means of reacting ultra-pure
process gas with the appropriate liquid solution.
3.2 This guide is not intended to be applicable to
“Point-of Use” generated process solutions.
3.3 This guide excludes construction protocols for
OSCG such as clean manufacturing, integrity of
fabrication, and prequalification of materials.
3.4 This guide does not intend to cover all the
important safety considerations which relate to the
OSCG systems, feed gas, equipment, or installations.
4 Referenced Standards
4.1 SEMI Standard
SEMI S2 Safety Guidelines for Semiconductor
Manufacturing Equipment
NOTE: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
5 Terminology
blending (or dilution) the combination of two or
more chemicals (one of which may be DI water) to
create the desired solution mixture.
clean sampling a specifically designed scheme to
allow for the taking of chemical samples, avoiding any
contamination from the operator or background
environment of the area.
day tank a chemical storage vessel, of appropriate
material(s), used to store a volume of product chemical
that could be consumed in one or more days.
DI water high purity 18 megohm water
OSCG system the stand-alone unit that produces (or
uses) a high purity gas and reacts it with water (or the
appropriate aqueous solution) to produce the desired
ultra pure chemical solution. This unit is intended for
use on the manufacturing site and in a centralized
scheme to support all or a portion of the site’s chemical
requirement(s).
overall implementation this term is used to refer to
the entire scope for an OSCG installation, including the
Gas Storage/Supply system, the OSCG system,
chemical storage tanks, chemical plumbing, and
interface with the chemical distribution system. Gas
supplies are covered in related guides.
process plumbing tubing or piping whose surface is
directly in contact with the chemical. Typically
constructed from high purity perfluorinated materials or
other high purity polymers.
product chemical the name given to the actual
chemical produced on site by the OSCG system.
pump a mechanical or pneumatically operated
device used to create hydraulic force for chemical
transfer.
QC tank storage tank for the staging of chemical to
be quality verified prior to release to the Product
storage tank. This optional quality verification scheme
allows for 100% chemical verification.
secondary containment pipe or tubing that contains
the process plumbing intended to provide a second level
of containment in the event of failure of the primary
SEMI F46-0999 © SEMI 1999 2
process plumbing. Clear PVC pipe is typically, but not
exclusively, used for the secondary containment.
SPC scheme an alternate quality verification scheme
that would involve random sampling and analysis of
product chemical. This scheme relies on Statistical
Process Control to monitor and ensure product
chemical quality.
6 General Requirements
6.1 Materials
Only specific materials are permitted
to be in direct contact with the gas(es) and/or chemi-
cal(s) used or produced in the OSCG system. This is
driven by both chemical compatibility to ensure long
term system survivability and product chemical purity.
6.1.1 Cabinet Construction Polypropylene or other
suitable materials house chemical handling components
(pumps, valves, filters, etc). All cabinets must be
designed to be leak tight and provide a minimum of
110% liquid containment within the cabinet.
6.1.2 Process Plumbing and Components
Polymeric materials are recommended for all plumbing
and components that will be in direct, routine contact
with the chemical solutions.
6.1.3 Feed Gas Plumbing and Components Feed
Gas, prior to purification (when gas purification is part
of the OSCG system), will be plumbed using
compatible materials such as stainless steel.
6.1.4 Storage Tanks Liner materials used in
chemical storage tanks that will be in direct contact
with the chemical solution will be chosen to maintain
chemical purity.
6.2 Overall System Installation
6.2.1 All OSCG systems, support equipment, process
plumbing, and tanks will be installed and facilitated
according to vendor guide which ensures mechanical
integrity, leak integrity, minimal contamination, and
overall proper operation.
6.2.2 All OSCG implementations will require the
following basic components: Feed Gas Storage and
Delivery Subsystem, the OSCG system(s), some type of
Quality Control Scheme with “Clean Sampling”
provisions, Product Chemical Storage with a suitable
volume of Product storage, and, optionally, a Back-up
Chemical scheme.
6.2.3 Prior to any introduction of chemical to any
system or subsystem, a complete water test is perf-
ormed to verify leak integrity. This process will also be
used to provide the initial clean-up of all systems,
tanks, and process plumbing.
6.2.4 The protocol for the installation and start-up of
all systems and subsystems follows a predefined
procedure and timeline which incorporates all of the
physical activities, testing parameters, and check points
for approval at each stage.
6.2.5 Cleanroom environment is not necessary.
6.3 Initial System Qualification
T he following
general procedure will be required for the initial
mechanical and chemical qualification of the OSCG
installation.
6.3.1 Electro-mechanical check-out
6.3.2 Initial chemical charge
6.3.3 Initial processing to fill and purge all systems,
plumbing, and tanks with chemical.
6.3.4 Initial sampling to verify purity and assay.
6.3.5 Continuous processing to prove purity and
capacity through a specific number of samples.
6.3.6 Continuous processing to establish overall
system reliability.
7 Basic Design Specificatio ns
7.1 General Each OSCG installation contains
certain basic components and a variety of design
options to meet a specific customer’s needs. This
section describes the basic installation requirements.
7.2 Feed Gas Storage All OSCG implementation
will require an appropriately sized Feed Gas storage
vessel.
7.2.1 The Feed Gas Storage vessel should be of
sufficient volume per customer, vendor, and logistical
considerations.
7.2.2 The gas delivery system must be designed to
deliver sufficient gas flowrates at the correct pressure to
the OSCG system.
7.2.3 The appropriate containment and controls are
required to ensure safe and reliable operation.
7.3 Gas Supply Plumbing Gas supply plumbing
will be required to bring Feed gas from the storage
vessel to the OSCG system.
7.3.1 Materials used for the gas supply plumbing will
be chosen based on compatibility with the specific feed
gas.
7.3.2 Supply plumbing size will be c hosen based on
the flow requirements and delivery distance to ensure
adequate supply volume and pressure at the OSCG
system.
7.3.3 Secondary containment may be required based
on the Feed gas, delivery plumbing routing, and local