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SEMI P10-0705 © SEMI 1990, 2005 132 8.1.408 MEASURED_ETCH_DEPTH_MARK_S ITE_ID — Must match ETCH_DEPTH _MARK_SITE_ID in <mask_order> for site being measured. If the custom er assigned no ETCH_DEPT H_MARK_SITE_ID for…

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SEMI P10-0705 © SEMI 1990, 2005 131
instances, then the vendor will add a suffix to CD_SITE_ID for each instance so that each
MEASURED_CD_SITE_ID in <mask_results> will be unique.
8.1.388 MEASURED_CD_THREE_SIGMA — (number) CD_THREE_SIGMA of the mask as measured by the
vendor. For the associated <cd_group> or <cd_set>, this is the product of 3 times the standard deviation of all
measurements
8.1.389 MEASURED_CD_TOLERANCE — (number) CD_TOLERANCE of the mask as measured by the vendor.
For the associated <cd_group> or <cd_set>, this is the difference between the mean of all included measurements
and the CD_TARGET. If the mean CD is larger than the target, then the value will be positive; if the mean CD is
smaller than the target, then the value will be negative.
8.1.390 MEASURED_CD_XY_DEVIATION — CD_XY_DEVIATION of the mask as measured by the vendor.
This is the maximum difference between any horizontally scanned and vertically scanned measurement at a
<cd_xy_site> among all sites within the <cd_xy_definition>. The MEASURED_VERTICAL_CD should always be
subtracted from the MEASURED_HORIZONTAL_CD.
8.1.391 MEASURED_CD_XY_MORPHOGRAPHY — The CD_MORPHOGRAPHY of all of the <cd_xy_site>
CD features if they were all specified in <mask_order> and if they were all of the same
morphography type. The
data value would be “unspecified” if some sites were not specified, or “mixed” if not all sites were the same.
8.1.392 MEASURED_CD_XY_TOLERANCE — CD_XY_TOLERANCE of the mask as measured by the vendor.
This is the difference between the mean of all horizontally scanned critical dimension measurements to the mean of
all vertically scanned critical dimension measurements within the <cd_xy_definition>. The mean of the vertically
scanned critical dimensions should always be subtracted from the mean of the horizontally scanned critical
dimensions.
8.1.393 MEASURED_CD_XY_TONE_CLEAR — (T or F) The CD_TONE_CLEAR of all of the <cd_xy_site>
CD features. They must all be the same as per the requirement of CD_XY_TOLERANCE and
CD_XY_DEVIATION.
8.1.394 MEASURED_CENTRALITY — CENTRALITY as measured by the vendor.
8.1.395 MEASURED_CLOSURE_LOCATION — (text) Description of the location where
MEASURED_REGISTR_CLOSURE was measured. This may be descriptive (e.g., “upper left”) or coordinate-
based, as agreed by the vendor and the customer.
8.1.396 MEASURED_CLOSURE_READING (x,y) REGISTR_CLOSURE as measured by the vendor in both
axes at MEASURED_CLOSURE_LOCATION.
8.1.397 MEASURED_DEFECT_COUNT — DEFECT_COUNT as measured by the vendor.
8.1.398 MEASURED_DEFECT_COUNT_REP — DEFECT_COUNT_REP as measured by the vendor.
8.1.399 MEASURED_DEFECT_COUNT_WITHIN_SPEC — Number of defects detected during inspection which
were smaller than the specification, excluding false detections.
8.1.400 MEASURED_DEFECT_DENSITY — DEFECT_DENSITY as measured by the vendor.
8.1.401 MEASURED_DEFECT_FILE_NAME — Name of data file containing results of defect inspection.
8.1.402 MEASURED_DEFECTIVE_DIE_COUNT — DEFECTIVE_DIE_COUNT as measured by the vendor.
8.1.403 MEASURED_DEFECTIVE_DIE_COUNT_REP — DEFECTIVE_DIE_COUNT_REP as measured by the
vendor.
8.1.404 MEASURED_DEFECTIVE_DIE_DENSITY — DEFECTIVE_DIE_DENSITY as measured by the
vendor.
8.1.405 MEASURED_ETCH_DEPTH — Phase shift etch depth as measured at a single site.
8.1.406 MEASURED_ETCH_DEPTH_AVERAGE — Mean of all customer-specified etch depth measurement
sites.
8.1.407 MEASURED_ETCH_DEPTH_ERROR — ETCH_DEPTH_ERROR as measured by the vendor.
SEMI P10-0705 © SEMI 1990, 2005 132
8.1.408 MEASURED_ETCH_DEPTH_MARK_SITE_ID — Must match ETCH_DEPTH_MARK_SITE_ID in
<mask_order> for site being measured. If the customer assigned no ETCH_DEPTH_MARK_SITE_ID for the
required location (e.g., only ETCH_DEPTH_MARK_LOCATION_DRAWING was used), the vendor will assign a
MEASURED_ETCH_DEPTH_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.409 MEASURED_ETCH_DEPTH_RANGE — ETCH_DEPTH_RANGE as measured by the vendor.
8.1.410 MEASURED_ETCH_DEPTH_TOLERANCE — ETCH_DEPTH_TOLERANCE as measured by the
vendor. If the mean etch depth is greater than the target, then reported value will be positive; if the mean etch depth
is less than the target, then reported value will be negative.
8.1.411 MEASURED_HORIZONTAL_CD — Measured value of horizontal critical dimension.
8.1.412 MEASURED_PERCENT_CLEAR — PERCENT_CLEAR as computed by the vendor.
8.1.413 MEASURED_PERCENT_DEFECTIVE_DIE — PERCENT_DEFECTIVE_DIE as measured by the
vendor.
8.1.414 MEASURED_PHASE_ANGLE — Phase angle as measured at a single site.
8.1.415 MEASURED_PHASE_ANGLE_AVERAGE — Mean of all customer-specified phase angle measurement
sites.
8.1.416 MEASURED_PHASE_ANGLE_ERROR — PHASE_ANGLE_ERROR as measured by the vendor.
8.1.417 MEASURED_PHASE_ANGLE_MARK_SITE_ID — Must match PHASE_ANGLE_SITE_ID in
<mask_order> for site being measured. If the customer assigned no PHASE_ANGLE_SITE_ID for the required
location (e.g., only PHASE_ANGLE_MARK_LOCATION_DRAWING was used), the vendor will assign a
MEASURED_PHASE_ANGLE_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.418 MEASURED_PHASE_ANGLE_RANGE — PHASE_ANGLE_RANGE as measured by the vendor.
8.1.419 MEASURED_PHASE_ANGLE_TOLERANCE — PHASE_ANGLE_TOLERANCE as measured by the
vendor. If the mean phase angle is greater than the target, then reported value will be positive; if the mean phase
angle is less than the target, then reported value will be negative.
8.1.420 MEASURED_REGISTR_CLOSURE — (x,y) REGISTR_CLOSURE as measured by the vendor in both
axes.
8.1.421 MEASURED_REGISTR_ERROR — REGISTR_ERROR as measured by the vendor. This is the
maximum registration deviation (positive or negative in either X or Y) of any measured registration mark.
8.1.422 MEASURED_REGISTR_FILE_NAME — Name of data file containing results of registration
measurement.
8.1.423 MEASURED_REGISTR_MARK_ERROR — (x,y) Registration error of an individual mark.
8.1.424 MEASURED_REGISTR_MARK_ID — Must match REGISTR_MARK_ID in <mask_order> for site
being measured. If the customer assigned no REGISTR_MARK_ID for the required location (e.g., only
MEASURE_FILE_NAME was used), the vendor will assign a MEASURED_REGISTR_MARK_ID for each
measurement location so that it is unique within the MASK_SET_ID. If REGISTR_MARK_ID was used as a
<pattern_options> in <mask_order> for a pattern with multiple instances, then the vendor will add a suffix to
REGISTR_MARK_ID for each instance so that each MEASURED_REGISTR_MARK_ID in <mask_results> will
be unique.
8.1.425 MEASURED_REGISTR_MARK_LOCATION — (x,y) Location of individual registration mark, relative
to nominal center of substrate (chrome side up), as measured by the vendor. This is the location of the mark as
measured by the vendor.
8.1.426 MEASURED_REGISTR_MARK_RESIDUAL — (x,y) Registration error of an individual mark after
removing scale and orthogonality.
SEMI P10-0705 © SEMI 1990, 2005 133
8.1.427 MEASURED_REGISTR_MINIMUM — (x,y) Measured minimum error of all registration measurements
in both x and y. Note that the location of the minimum in x is probably not at the same location as the minimum in
y.
8.1.428 MEASURED_REGISTR_MAXIMUM — (x,y) Measured maximum error of all registration measurements
in both x and y. Note that the location of the maximum in x is probably not at the same location as the maximum in
y.
8.1.429 MEASURED_REGISTR_ORTHO — REGISTR_ORTHO as measured by the vendor.
8.1.430 MEASURED_REGISTR_RELATIVE — REGISTR_RELATIVE as measured by the vendor.
8.1.431 MEASURED_REGISTR_RESIDUAL — (x,y) REGISTR_RESIDUAL as measured by the vendor.
8.1.432 MEASURED_REGISTR_RESIDUAL_THREE_SIGMA — (x,y)
REGISTR_RESIDUAL_THREE_SIGMA as measured by vendor.
8.1.433 MEASURED_REGISTR_SCALE — (x,y) REGISTR_SCALE as measured by the vendor.
8.1.434 MEASURED_REGISTR_THREE_SIGMA — (x,y) REGISTR_THREE_SIGMA as measured by vendor.
8.1.435 MEASURED_REGISTR_TOLERANCE — (x,y) The mean measured registration error in both x and y.
Deviations for which the measured location is to the right or above the reference grid or reference mask are
considered positive; measured locations to the left or below the reference grid or reference mask are considered
negative.
8.1.436 MEASURED_TRANSMISSION — Phase shift transmission as measured at a single site.
8.1.437 MEASURED_TRANSMISSION_AVERAGE — Mean of all customer-specified transmission
measurement sites.
8.1.438 MEASURED_TRANSMISSION_ERROR — TRANSMISSION_ERROR as measured by the vendor.
8.1.439 MEASURED_TRANSMISSION_MARK_SITE_ID — Must match TRANSMISSION_MARK_SITE_ID
in <mask_order> for site being measured. If the customer assigned no TRANSMISSION_MARK_SITE_ID for the
required location (e.g., only TRANSMISSION_MARK_LOCATION_DRAWING was used), the vendor will assign
a MEASURED_TRANSMISSION_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.440 MEASURED_TRANSMISSION_RANGE — TRANSMISSION_RANGE as measured by the vendor.
8.1.441 MEASURED_TRANSMISSION_TOLERANCE — TRANSMISSION_TOLERANCE as measured by the
vendor. If the mean transmission is greater than the target, then reported value will be positive; if the mean
transmission is less than the target, then reported value will be negative.
8.1.442 MEASURED_VERTICAL_CD — Measured value of vertical critical dimension.
8.1.443 MFG_BIAS_PREAPPLIED — Amount (in microns, prior to scaling) of sizing pre-applied by the customer
to support mask processing of CD_DATA to achieve CD_TARGET. A negative MFG_BIAS_PREAPPLIED
indicates that the digitized geometry has been made smaller.
8.1.444 MFG_SITE_REQD — Alphanumeric identification of qualified manufacturing sites, to be agreed between
customer and vendor. For a given MASK_ID, MFG_SITE_REQD may not be used in combination with
EQUIP_SITE_REQD.
8.1.445 MFG_SITE_USED — Alphanumeric identification of manufacturing site used, to be agreed between
customer and vendor.
8.1.446 MILESTONE — (ORDER_RECEIVED, ORDER_ACCEPTED, DATA_PREPARED,
MASK_WRITTEN, CDS_MEASURED, REGISTR_MEASURED, DEFECTS_REPAIRED,
PELLICLES_APPLIED, POST_PELLICLE_INSPECTION, SHIPPED, DELIVERED, ON_HOLD, OFF_HOLD)
notifies the customer that the MASK_ID has passed the indicated processing step, or is on hold.
8.1.447 MILESTONES — (T or F) If T, the vendor is requested to use <mask_results> (see §7.5) to notify the
customer each time the mask completes a significant processing step. Within this standard, these significant steps