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SEMI P6-88 © SEMI 198 8, 1996 2 Table 1 Dime nsions of Registration M ark For A ll Mask Ty pes (all dimensions are i n micrometers (µm)) Type of Photom ask Width Length User Define d Area Total Pattern W indow 1× Mast er…

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SEMI P6-88 © SEMI 1988, 19961
SEMI P6-88
SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
1 General Specification
1.1 Scope
1.1.1 This specification defines the shape, range of
sizes, and general placement of a registration mark for
use on all photomasks. Methods of use will be stated in
accompanying application notes (to be furnished at a
later date).
1.2 Applicable Documents — None.
2 Detail Specifications
2.1 Introduction
2.1.1 The complete specification for this registration
mark is to be agreed upon by the circuit designer, mask
maker, and the mask user.
2.2 Requirements
2.2.1 This specification covers a defined mark placed
photolithographically on photomasks for the express
purpose of determining the registration accuracy of one
imaged photomask to another imaged photomask within
the same set of photomasks.
2.3 Other
2.3.1 This mark is not intended to be used for the
determination of overlay accuracy of an imaged layer of
a photomask onto a maker to any subsequent imaged
layers on the same wafer.
3 Guidelines for Shape and Sizes of
Registration Mark
3.1 The shape of the mark shall be in the form of a
cross (see Figure 1).
3.2 The area of intersection of the horizontal and
vertical lines shall be “user-defined.” The designer,
mask maker, or user may define any shape of geometry
within this area. The “user-defined” geometry used
shall not exceed the width or height of the area of
intersection (see Figure 2).
3.3 The width of both the horizontal and vertical lines
shall be equal.
3.4 The length of both the horizontal and vertical lines
shall be equal.
3.5 The width and length of the horizontal and vertical
lines may vary due to design rules, scaling, process
bias, etc. Table 1 lists the design dimensions for each
type of photomask. Sections 3.3 and 3.4 are not
superceded by this statement.
3.6 Any of the four quadrants created to the outside of
the cross shall be defined as “No-Man’s Land” and
shall not have any geometry or marks placed within
them (see Figure 3).
3.7 A field or registration mark (i.e., dark or clear) is
user-definable.
3.8 The mark shall be placed as per attached
application notes (to be furnished at a later date).
SEMI P6-88 © SEMI 1988, 1996 2
Table 1 Dimensions of Registration Mark For All Mask Types (all dimensions are in micrometers (µm))
Type of Photomask Width Length User Defined Area Total Pattern Window
1× Masters 4 – 8 10 – 15 min. 4 × 4
max. 8 × 8
min. 24 × 24
max. 38 × 38
1× Stepper Reticles 4 – 8 10 – 15 min. 4 × 4
max. 8 × 8
min. 24 × 24
max. 38 × 38
5× Stepper Reticles 8 – 40 20 – 75 min. 8 × 8
max. 40 × 40
min. 48 × 48
max. 190 × 190
10× Stepper Reticles 16 – 80 40 – 150 min. 16 × 16
max. 80 × 80
min. 96 × 96
max. 380 × 380
Figure 1
Shape of Registration Mark
SEMI P6-88 © SEMI 1988, 19963
Figure 2
User-Defined Area