semi合集-English.pdf - 第7916页

SEMI T14.1-0705 © SEMI 2005 5 Ori entat ion Fidu cial Axi s [011] Notch WAFER SUR FACE 3.0 fro m Ori entat ion Fi du cial Axi s Ou ter p eriph ery of FQ A Edge Exclusive Area Edg e Prof ile regi on Wafer Periphery Ori en…

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SEMI T14.1-0705 © SEMI 2005 4
4.17 µ m
µ
m
µ
m
+
10%
-
20%
µ
m
+
10%
-
20%
µ
m
+
10%
-
20%
µ
m
+
10%
-
20%
+
10%
-
20%
4.0
4.0
NOTE: Example of circular dots
Figure 2
Cell Spacing
NOTE: Example of circular dot
Figure 3
Dot shape Circle (Projected sectional area)
To Wafer Center
The Primary Border Row
Reference Point
The Primary Border Column
To Wafer Center
The Primary Border Row
Reference Point
The Primary Border Column
To Wafer Center
The Primary Border Row
Reference Point
The Primary Border Column
To Wafer Center
The Primary Border Row
Reference Point
The Primary Border Column
NOTE: Example of circular dots
Figure4
Data Matrix Code Fields
ECC200 – 12 Rows × 26 Columns
SEMI T14.1-0705 © SEMI 2005 5
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
Orientation Fiducial Axis
[011]
±
1.0
º
Notch
WAFER SURFACE
3.0
±
0.1
º
from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
ID Mark Area
R
ef
er
en
ce
P
o
i
n
t
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0
±
0.1 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
ID Mark Area
R
ef
er
en
ce
P
o
i
n
t
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
Orientation Fiducial Axis
[011]
±
1.0
º
Notch
WAFER SURFACE
3.0
±
0.1
º
from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
ID Mark Area
R
ef
er
en
ce
P
o
i
n
t
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
Orientation Fiducial Axis
[011]
Notch
WAFER SURFACE
3.0
±
0.1 from
Orientation Fiducial Axis
Outer periphery of FQA
Edge Exclusive Area
Edge Profile region
Wafer Periphery
ID Mark Area
R
ef
er
en
ce
P
o
i
n
t
NOTE: Figure 5 is not to scale.
Figure5 (Top view)
Data Matrix Code Location on Front Bevel Surface of Notched 300 mm Diameter Wafer
SEMI T14.1-0705 © SEMI 2005 6
RELATED INFORMATION 1
APPLICATION NOTES
NOTICE: This related information is not an official part of SEMI T14.1 and was derived from full letter ballot
procedures on May 20, 2005.
R1-1 Shape and Size of the Protrusion Dot Mark
R1-1.1 A microdot mark is formed by laser irradiation and consists of a single dot mark on each laser-irradiated
point. The mark has a single protrusion, which includes a concave portion provided around the protrusion and lower
than a surface of the wafer and whose center portion protrudes upward so as to be higher than the surface of the
wafer. The nominal shape of the dot produced in the matrix may be circular or square. Its diameter or edge length
shall be 4.0 µm + 10% – 20%. The protrusion height is more than 200 nanometers, formed on each laser irradiate
point, as shown in below Figure.
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
A
>
=
4.0 m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
H 200nm
4.0
μ
m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
>
=
4.0 m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
H 200nm
4.0 m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
A
>
=
4.0 m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
H 200nm
4.0
μ
m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
>
=
4.0 m
H
+10%
- 20%
A
4.0 m
H
+10%
- 20%
A
H 200nm
4.0 m
H
NOTE: Figure R1-1 is not to scale.
Example of circular dot
Figure R1-1
Dot Height & Vertical Cross Section
R1-2 Location of Data Matrix Code Symbol
R1-1.2 Data matrix code location is defined on the front bevel of a 300 mm diameter notched wafer, whose side
view is referred from SEMI M1.