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SEMI F75-1102 © SEMI 2002 1 SEMI F75-1102 GUIDE FOR QUALITY MONITORING OF ULTRAPURE WATER USED IN SEMICONDUCTOR MANUFACTURING This guide was technically approved by the Global Faci lities Committee and is the di rect res…

SEMI F74-1103 © SEMI 2002, 2003 15

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SEMI F75-1102 © SEMI 2002 1

SEMI F75-1102

GUIDE FOR QUALITY MONITORING OF ULTRAPURE WATER USED IN

SEMICONDUCTOR MANUFACTURING

This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the

North American Facilities Committee. Current edition approved by the North American Regional Standards

Committee on August 29, 2002. Initially available at www.semi.org September 2002; to be published

November 2002.

1 Purpose

1.1 These guides provide recommendations for facility

engineers and other manufacturing and quality

professionals who may be responsible for establishing

programs to monitor and control the quality of their

ultrapure water (UPW) systems through to point-of-use

(POU). These guides may be used to help determine the

parameters that should be monitored for UPW that is

produced, distributed and used throughout the

manufacturing facility, and the frequency and location

of testing.

NOTE 1: These suggested guides are published as technical

information and are intended for informational purposes only.

2 Scope

2.1 UPW is used extensively in the production of

semiconductor devices for all wet processing steps.

Ultrapure water systems need to be tested and

monitored to ensure that the UPW being produced

matches the specifications established by the

manufacturing process. The purity of the UPW may

affect device yield unless a wide range of parameters is

closely controlled at the point of distribution (POD).

Semiconductor devices are currently being designed

with smaller linewidths (< 0.13–0.18 µm) and are more

susceptible to low level impurities.

2.2 UPW systems are monitored for continuous

performance for desired and achievable levels of

quality. Action limits are generally set to determine

when system performance data warrants that corrective

action is needed. Table 1 Parameters and Range of

Performance in SEMI F63 may be a useful reference

for establishing quality levels.

2.3 In more critical processes, the quality of the UPW

also needs to be monitored at the POU where the UPW

is in contact with the wafer. The quality of the UPW

should not be expected to be identical to the quality of

the UPW being produced at final filter (FF), which is

not subject to conditions within the tool or distribution

system.

2.4 These guides logically follow the series of SEMI

guides developed for UPW, which include a standard

defining the performance of a UPW system, and a

standard defining the quality of UPW (see reference

section). The Schematic of a Typical Ultrapure Water

System in Figure 1 of SEMI F61 may be a useful

reference for determining sampling points.

2.5 Guides are provided concerning the frequency and

location of sampling for those parameters that are not

available from on-line analyzers. Frequency of

sampling should be based on the specifications set by

manufacturing for the quality of the POD UPW, the

number and locations of on-line analyzers, the stability

of the incoming feed water to the system, and the

historical performance of the UPW system over time.

2.6 These guides may also be used to establish process

control criteria for the incoming feedwater,

performance of UPW system components and POU

rinse baths.

2.7 This standard does not purport to address safety

issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety health practices and determine the

applicability or regulatory limitations prior to use.

3 Limitations

3.1 These guides have been developed with

consideration of various other sources deemed to be

relevant for this purpose. However this guide was not

intended to be identical to or consistent with any other

industry document or standard.

3.2 Monitoring and testing of recycled or reclaimed

water systems are not specifically addressed in these

guides. Additional test parameters, such as

quantification and identification of organic species in

reclaim water, should be added to monitoring programs

for reclaim and reuse waters.

3.3 Measuring the purity of UPW can prove

challenging. Many on-line instruments (sodium

analyzers, TOC analyzers, silica analyzers, optical

particle counters, non-volatile residue analyzers)

provide very low limits of detection but may not be

capable of being calibrated in the range of detection or

may have very poor accuracy at low levels. On-line

analyzers should primarily be used for trend analysis.

Many tests can still be performed more accurately and

reproducibly in a laboratory environment but taking

SEMI F75-1102 © SEMI 2002 2

batch samples can prove time-consuming and be prone

to sampling error.

4 Referenced Standards

4.1 SEMI Standards

SEMI F61 — Guide for Ultrapure Water System Used

in Semiconductor Processing

SEMI F63 — Guidelines for Ultrapure Water Used in

Semiconductor Processing

NOTE 2: As listed or revised, all documents cited shall be the

latest publications of adopted standards.

5 Terminology

5.1 Abbreviations and Acronyms

NOTE 3: All other abbreviations and acronyms are defined in

the SEMI Compilation of Abbreviations and Acronyms

available at web site, http://www.semi.org/.

5.1.1 CFU — Colony-Forming Units

5.1.2 DO — Dissolved Oxygen

5.1.3 EDI — Electrodionization

5.1.4 EDX — Energy Dispersive X-Ray Microanalysis

5.1.5 FF — Final Filter

5.1.6 IC— Ion Chromatography

5.1.7 NDIR — Non-Dispersive Infrared Analysis

5.1.8 OPC — Optical Particle Counters

5.1.9 POD — Point Of Distribution

5.1.10 RO — Reverse Osmosis

5.1.11 TDS — Total Dissolved Solid

5.1.12 THM — Trihalomethanes

6 Units

6.1 Parts per million (ppm) is equivalent to µg/mL or

mg/L.

6.2 Parts per billion (ppb) is equivalent to ng/mL or

µg/L.

6.3 Parts per trillion (ppt) is equivalent to pg/mL or

ng/L.

7 Use of the Guides

7.1 Monitoring programs should reflect the age and

complexity of the UPW equipment and the needs of the

manufacturing process.

7.2 The quality of UPW at the POU may be negatively

impacted by 1.) contamination sources within a tool, 2.)

the design of the tool, 3.) the materials of construction

of the tool and piping distribution, and 4.)

contamination loading in the bath from build-up after

multiple rinse cycles.

7.3 Sampling methods and contamination control are

of paramount importance when attempting to measure

the listed parameters at very low levels of sensitivity.

7.4 The quality of the data measured may depend on

which testing methods and calibration techniques are

used. Consequently, trends observed in the values may

be more meaningful than absolute values, especially for

certain on-line monitors calibrated for ultrasensitive

detection. In addition, online and offline measurements

may not correlate depending on the measurement

technique and level of sensitivity of the measurement.

8 Tests For Monitoring UPW Production and

Distribution

NOTE 4: Since SEMI Guides do not require analytical data or

methods to support them, the recommendation of specific

analytical methods are only for informational purposes.

Alternative methods may also be applicable.

NOTE 5: See Table 1 at the end of this document for

summary of recommended testing frequency and sampling

points.

8.1 Resistivity (megohm-centimeters)

8.1.1 Resistivity (the inverse of conductivity) is a

general measure of ionic activity and is measured by an

on-line meter. The resistivity of UPW should be

approximately 18.2 mΩcm depending on the resolution

of the instrument.

NOTE 6: 18.25 mΩcm is the theoretical upper limit for pure

water at 25°C.

8.2 Total Oxidizable (Organic) Carbon (TOC) (ppb)

8.2.1 Carbon Sources in Water Supplies

8.2.1.1 Incoming feed water contains both inorganic

and organic carbon. Inorganic carbon as dissolved

carbon dioxide (CO

), bicarbonate, and carbonate can

be present at high ppm levels according to the geology

of the water supply. Organic carbon reflects biological

input and man-made contaminants such as oils,

pesticides, and fertilizers. Ground and well waters

normally have significantly lower organic content than

surface waters. To remove the majority of organics,

most UPW systems employ reverse osmosis; anion

exchange resin and ultraviolet (UV) destruction are also

employed to remove organics. Some volatile organics,

such as trihalomethanes (THM), may be controlled by

the use of vacuum degasification. The control of

organics is essential for preventing organic fouling and

maintaining resin beds at high efficiency. In addition,