semi合集-English.pdf - 第5635页

SEMI P10-0705 © SEMI 1990, 2005 130 8.1.368 MASK_SET_VERSION — Nam e used by customer for versio ns of the mask set, to be used to cross - reference MASK_SET _ID to custom er’s in tern al tracking system. This is primari…

100%1 / 7923
SEMI P10-0705 © SEMI 1990, 2005 129
8.1.351 LITHO_MODEL_REQD — (ALTA_3000, ALTA_3500, ALTA_3700, ALTA_4300, CORE_2000,
CORE_2100, CORE_2500, CORE_2564, EBM_3500, EBM_4000, HL_800, HL_900, HL_950, HL_7000,
JBX_3030, JBX_7000, JBX_9000, LRS_55, LRS_800, MANN_3000, MANN_3600, MANN_3696, MEBES III,
MEBES IV, MEBES_4000, MEBES_4500, MEBES_4700, MEBES_5000, MEBES_5500, MEBES_EXARA,
MM_101, MP_508, OMEGA_6600, SIGMA_7100, SIGMA_7300, TAMARACK_142, TAMARACK_155,
TOSHIBA_4700, TRE_220, ULTRABEAM_V2000, ZBA_21, ZBA_23H, ZBA_31, ZBA_31H+, ZBA_320,
ZBA_340, and others on request) Model of acceptable mask writing equipment.
8.1.352 LITHO_MODEL_USED — The model name of the lithography tool used to perform the lithography
operation. See LITHO_MODEL_REQD.
8.1.353 LOCATION — (x,y) Location of the center of the initial pattern or cell, relative to center of the preceding
CELL_ID (before mirroring or scaling).
8.1.354 LOCATION_SPEC — Alphanumeric identification of customer-supplied specification for pattern or cell
placement.
8.1.355 LOG_FILE_NAME— (text) Name identifying the log output file for RUNSET_NAME. If this keyword
appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.356 MACHINE_SERIAL_NUMBER — (text) The serial number of the lithography tool used to perform the
lithography operation.
8.1.357 MAILING_ADDRESS — Postal address.
8.1.358 MASK_COATING — (HIGH_REFLECTIVE_CHROME, MEDIUM_REFLECTIVE_CHROME,
LOW_REFLECTIVE_CHROME, SEE_THROUGH_CHROME, IRON_OXIDE, CHROME_OXIDE,
EMULSION) or in the case of other coatings, an alphanumeric description. (See SEMI P2.)
8.1.359 MASK_GROUP_ID — Name of the mask group which follows; must be used in all references within this
MASK_SET_ID to this mask group.
8.1.360 MASK_ID — Unique integer identifier of each mask within mask set. All patterns referenced by the
MASK_GROUP_ID’s PLACEMENT_TOP_CELL whose LEVEL_ID’s match this MASK_ID will appear on the
mask. When LEVEL_ID is “A”, the pattern will appear on all masks whose PLACEMENT_-TOP_CELL
references the pattern group.
8.1.361 MASK_NAME — Name used by customer for mask, to be used to cross-reference MASK_ID to
customer’s internal tracking system. This is primarily for the customer’s use only, but should be recorded by the
vendor and reported back in <mask_results>.
8.1.362 MASK_REGISTR_MARK — (x,y) Location of registration reference mark in <mask_order>, relative to
the nominal center of substrate (chrome side up).
8.1.363 MASK_REGISTR_MARK_LOCATION — (x,y) Location of individual registration mark, relative to
nominal center of substrate (chrome side up), based on <mask_order> information. This is the target location for the
mark, reflected in <mask_results>.
8.1.364 MASK_ROTATION — (0, 90, 180 and 270) Degrees to rotate the entire set of mask data (patterns, titles,
barcodes, etc.) counterclockwise (assuming a chrome-up orientation).
8.1.365 MASK_SERIAL_NUMBER — (alphanumeric) The serial number title written on the mask during
lithography - usually numeric, but alphanumeric if agreed by customer and vendor.
8.1.366 MASK_SET_ID — The “name” of the mask set, often the device name or number. This must be used in all
future references to this mask set and must be unique among mask sets ordered by the customer.
8.1.367 MASK_SET_NAME — Name used by customer for mask set, to be used to cross-reference
MASK_SET_ID to customer’s internal tracking system. This is primarily for the customer’s use only, but should be
recorded by the vendor and reported back in <mask_results>.
SEMI P10-0705 © SEMI 1990, 2005 130
8.1.368 MASK_SET_VERSION — Name used by customer for versions of the mask set, to be used to cross-
reference MASK_SET_ID to customer’s internal tracking system. This is primarily for the customer’s use only, but
should be recorded by the vendor and reported back in <mask_results>.
8.1.369 MASK_SHIPPED_DATE_TIME – (date) The date and time the mask left the mask shop for delivery to the
customer.
8.1.370 MAX_MASKS_IN_PACKAGE — Integer maximum number of masks to be shipped inside PACKAGE.
8.1.371 MEASURE_FILE_FORMAT — (MF2, MF3, MTX, IMP, and others on request.)
8.1.372 MEASURE_FILE_NAME — Alphanumeric name of file to be used for registration mark locations. When
MEASURE_FILE_NAME follows MASK_REGISTR_MARK or CELL_REGISTR_MARK, the mark locates the
origin of the measure file. When in <mask_options> or in <pattern_options>, MEASURE_FILE_NAME must
follow either MASK_REGISTR_MARK or CELL_REGISTR_MARK.
8.1.373 MEASURED_CD — The critical dimension measurement at the CD_LOCATION, as measured by the
vendor.
8.1.374 MEASURED_CD_DENSE_MEAN — Average of all measured dense CD features.
8.1.375 MEASURED_CD_DENSE_RANGE — CD_RANGE of the dense features on the mask as measured by
the vendor.
8.1.376 MEASURED_CD_DEVIATION_FROM_MEAN — (n, m) For all measurements in the associated
<measured_cd_results> section, the difference (n) between the maximum measurement and the mean, and the
difference (m) between the mean and the minimum measurement. “n” will always be positive; “m” will always be
negative.
8.1.377 MEASURED_CD_DEVIATION_FROM_TARGET — (numeric) CD_DEVIATION_FROM_TARGET of
the mask as measured by the vendor. This is the largest single deviation of all measurement points from the
specified target. If the largest deviation is for a CD larger than the target, then the value will be positive; if the
largest deviation is for a CD smaller than the target, then the value will be negative.
8.1.378 MEASURED_CD_FILE_NAME — Name of data file containing results of CD measurement.
8.1.379 MEASURED_CD_ISO_DENSE_TOLERANCE — CD_ISO_DENSE_TOLERANCE of the mask as
measured by the vendor. The mean of the ISOLATED critical dimensions should always be subtracted from the
mean of the DENSE critical dimensions.
8.1.380 MEASURED_CD_ISO_MEAN — Average of all measured isolated CD features.
8.1.381 MEASURED_CD_ISO_RANGE — CD_RANGE of the isolated features on the mask as measured by the
vendor.
8.1.382 MEASURED_CD_LOCATION — (x,y) The actual location, relative to the nominal center of the
mask, of
the critical dimension as measured by the vendor.
8.1.383 MEASURED_CD_MAX — (number) For the associated <cd_group> or <cd_set>, the maximum of all
measurements.
8.1.384 MEASURED_CD_MEAN — (number) For the associated <cd_group> or <cd_set>, the mean of all
measurements.
8.1.385 MEASURED_CD_MIN — (number) For the associated <cd_group> or <cd_set>, the minimum of all
measurements.
8.1.386 MEASURED_CD_RANGE — (number) CD_RANGE of the mask as measured by the vendor.
For the
associated <cd_group> or <cd_set>, this is the difference between the maximum measurement and the minimum
measurement.
8.1.387 MEASURED_CD_SITE_ID — Must match CD_SITE_ID in <mask_order> for site being measured. If the
customer assigned no CD_SITE_ID for the required location (e.g., only CD_LOCATION_DRAWING was used),
the vendor will assign a MEASURED_CD_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID. If CD_SITE_ID
was used as a <pattern_options> in <mask_order> for a pattern with multiple
SEMI P10-0705 © SEMI 1990, 2005 131
instances, then the vendor will add a suffix to CD_SITE_ID for each instance so that each
MEASURED_CD_SITE_ID in <mask_results> will be unique.
8.1.388 MEASURED_CD_THREE_SIGMA — (number) CD_THREE_SIGMA of the mask as measured by the
vendor. For the associated <cd_group> or <cd_set>, this is the product of 3 times the standard deviation of all
measurements
8.1.389 MEASURED_CD_TOLERANCE — (number) CD_TOLERANCE of the mask as measured by the vendor.
For the associated <cd_group> or <cd_set>, this is the difference between the mean of all included measurements
and the CD_TARGET. If the mean CD is larger than the target, then the value will be positive; if the mean CD is
smaller than the target, then the value will be negative.
8.1.390 MEASURED_CD_XY_DEVIATION — CD_XY_DEVIATION of the mask as measured by the vendor.
This is the maximum difference between any horizontally scanned and vertically scanned measurement at a
<cd_xy_site> among all sites within the <cd_xy_definition>. The MEASURED_VERTICAL_CD should always be
subtracted from the MEASURED_HORIZONTAL_CD.
8.1.391 MEASURED_CD_XY_MORPHOGRAPHY — The CD_MORPHOGRAPHY of all of the <cd_xy_site>
CD features if they were all specified in <mask_order> and if they were all of the same
morphography type. The
data value would be “unspecified” if some sites were not specified, or “mixed” if not all sites were the same.
8.1.392 MEASURED_CD_XY_TOLERANCE — CD_XY_TOLERANCE of the mask as measured by the vendor.
This is the difference between the mean of all horizontally scanned critical dimension measurements to the mean of
all vertically scanned critical dimension measurements within the <cd_xy_definition>. The mean of the vertically
scanned critical dimensions should always be subtracted from the mean of the horizontally scanned critical
dimensions.
8.1.393 MEASURED_CD_XY_TONE_CLEAR — (T or F) The CD_TONE_CLEAR of all of the <cd_xy_site>
CD features. They must all be the same as per the requirement of CD_XY_TOLERANCE and
CD_XY_DEVIATION.
8.1.394 MEASURED_CENTRALITY — CENTRALITY as measured by the vendor.
8.1.395 MEASURED_CLOSURE_LOCATION — (text) Description of the location where
MEASURED_REGISTR_CLOSURE was measured. This may be descriptive (e.g., “upper left”) or coordinate-
based, as agreed by the vendor and the customer.
8.1.396 MEASURED_CLOSURE_READING (x,y) REGISTR_CLOSURE as measured by the vendor in both
axes at MEASURED_CLOSURE_LOCATION.
8.1.397 MEASURED_DEFECT_COUNT — DEFECT_COUNT as measured by the vendor.
8.1.398 MEASURED_DEFECT_COUNT_REP — DEFECT_COUNT_REP as measured by the vendor.
8.1.399 MEASURED_DEFECT_COUNT_WITHIN_SPEC — Number of defects detected during inspection which
were smaller than the specification, excluding false detections.
8.1.400 MEASURED_DEFECT_DENSITY — DEFECT_DENSITY as measured by the vendor.
8.1.401 MEASURED_DEFECT_FILE_NAME — Name of data file containing results of defect inspection.
8.1.402 MEASURED_DEFECTIVE_DIE_COUNT — DEFECTIVE_DIE_COUNT as measured by the vendor.
8.1.403 MEASURED_DEFECTIVE_DIE_COUNT_REP — DEFECTIVE_DIE_COUNT_REP as measured by the
vendor.
8.1.404 MEASURED_DEFECTIVE_DIE_DENSITY — DEFECTIVE_DIE_DENSITY as measured by the
vendor.
8.1.405 MEASURED_ETCH_DEPTH — Phase shift etch depth as measured at a single site.
8.1.406 MEASURED_ETCH_DEPTH_AVERAGE — Mean of all customer-specified etch depth measurement
sites.
8.1.407 MEASURED_ETCH_DEPTH_ERROR — ETCH_DEPTH_ERROR as measured by the vendor.