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SEMI E49.6-1103 © SEMI 1995, 2003 7 NOTICE: SEMI makes no warranties or representatio ns as to the suitability of th e standards set forth herein for any particular application. Th e determination of the suitability of t…
SEMI E49.6-1103 © SEMI 1995, 2003 6
Table 4 Trace Moisture and Oxygen Test Report
Trace Moisture and Oxygen Test Report
Customer: Date:
Location: Report:
Type Instrument/Model Serial Number
Trace O
2
Trace H
2
O
Date Time System Inboard Leak Rate Comments
Comments:
Tested by:
QA Representative:
Table 5 Helium Leak Test Report
Helium Leak Test Report
Customer: Date:
Location: Report:
Project:
Type Instrument/Model Serial Number
He MSLD
Date Time System Inboard Leak
Rate
Outboard Leak
Rate
Comments
Comments:
Tested by:
QA Representative:
SEMI E49.6-1103 © SEMI 1995, 2003 7
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant
literature respecting any materials mentioned herein. These standards are subject to change without notice.
The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted
material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights and
the risk of infringement of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI E49.7-0304 © SEMI 1995, 2004 1
SEMI E49.7-0304
PURITY GUIDE FOR THE DESIGN AND MANUFACTURE OF
ULTRAPURE WATER AND LIQUID CHEMICAL SYSTEMS IN
SEMICONDUCTOR PROCESS EQUIPMENT
This guide was technically approved by the Global Liquid Chemicals Committee and is the direct
responsibility of the North American Liquid Chemicals Committee. Current edition approved by the North
American Regional Standards Committee on December 4, 2003. Initially available at www.semi.org
February 2004 to be published March 2004. Originally published 1995, last published July 2002.
This standard was editorially modified in January 2004 to correct a typographical error. A change was made
to Section 10.5.4.
1 Purpose
1.1 The objective of this document is to provide
recommendations that will help maintain the quality of
the liquid being delivered. Recommendations are given
for activities specific to polymer ultrapure water and
liquid chemical systems used in Semiconductor process
equipment.
NOTE 1: As with any SEMI guide, the practices outlined
herein are recommendations, not specifications. Users of this
document should recognize that alternate practices are not
excluded as long as they produce results that are equivalent to
those produced using the recommendations outlined here and
meet the requirements of the end user.
2 Scope
2.1 It is within the scope of this standard to recommend
procedures that complement the requirements in SEMI
F57 with the goal of ensuring the quality of the liquid
being delivered. Recommendations are provided in the
following areas:
• Manufacturing Facility
• Utilities
• System Design
• Pre-Production and Inspection
• Assembly
• System Testing
• Packaging
• Traceability
2.2 For the purposes of this document, systems include
all liquid delivery components inside semiconductor
process equipment and ancillary support equipment, as
well as additional plumbing provided by the OEM with
the processing equipment. This includes any assembly
of two or more liquid delivery components provided
with or within semiconductor process equipment.
2.3 Typical semiconductor process equipment with
ultrapure water and liquid chemical delivery systems
includes, but is not limited to the following:
• Wafer Handling Equip.
• Wafer Cleaning Systems
• Chemical Filtration/Mixing Skids provided by
OEM
• Wet Clean Stations
• Wafer Scrubbers
• CMP
• Photolithography coaters and developers
• Ion Implanters
• Metrology equipment
NOTICE: This standard does not purport to address
safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory or other limitations prior
to use.
3 Limitations
3.1 This standard does not define the performance
requirements of components, which may be addressed
by SEMI F57. Nor does this standard define the
performance requirements of equipment systems.
Facility distribution systems are also outside the scope
of this standard.
3.2 Organic liquids, such as isopropyl alcohol and
methyl alcohol, are typically in contact with stainless
steel or other non-polymeric components. The polymer
systems described within this document are NOT
intended for use with such organic liquids. Refer to
SEMI E49.4, SEMI E49.5, and SEMI E49.6 for
information on stainless steel components.