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SEMI E46-0301 © SEMI 1995 , 2001 6 12.6 R.E. Clem e nt, K.W.M. Siu, an d H .H. Hi ll Jr., “Instrum e ntation for Trace Organic Monitoring,” Lewin Publis hers, Boca Raton 1991. Table 1 Int egration Range for the Evaluat i…
SEMI E46-0301 © SEMI 1995, 20015
the weighing bottle (holding the Si-chips) and its lid are
separately put inside the minienvironment. Then the
minienvironment is closed and kept closed for a defined
period of time. For this test method, one week (168 h)
is defined. After expiry of the storage time, the
weighing bottle is closed with its lid and removed from
the minienvironment.
10.4.1 The same procedure applies to standard wafer
boxes or to SMIF and similar boxes.
10.5 Headspace Sampling of Polymer Material at
Different Temperatures — The prepared polymer
material inside the wrapped weighing bottle (see
Section 10.2.5) is stored:
• either under clean laboratory conditions at room
temperature for a defined period of time
• or in a suitable oven at a temperature of 70°C or
120°C for exactly 1 hour followed by a cooling
period of 1 hour.
10.5.1 The wrapped weighing bottle is handled with a
pair of crucible tongs only.
10.6 Testing Requirements (check for device overload
during measurement)
10.6.1 Positive Ions: Water Cluster Signal Intensity —
The water cluster signal intensity must not decrease by
more than 10% of the blank spectra intensity during
measurement time; otherwise, the ion molecule reactor
has been overloaded. If this is the case, the polymer
sample is not likely to be suitable for use in
semiconductor processing because of unacceptable
properties.
10.6.2 Negative Ions: Oxygen Cluster Signal Intensity
— The same procedure as that in Section 10.6.1 must
be performed for negative ions; in this case, the oxygen
cluster signal intensity must not decrease by more than
20%.
11 Calculation
11.1 Description of Mobility Spectra Evaluation —
The signal intensities of the detected sample
contaminants are integrated over a specific interval for
both polarities. The background signal intensity is
integrated, outside the specific measurement interval,
with preference to spectral region prior to the peaks of
the reactant ions. The total background intensity
(integration of the relevant background signal) is
subtracted from the integrated contamination intensity
(background correction). The mean value of the
contamination signal from the blank measurement
(Section 10.3.1) spectra is subtracted accordingly. This
leads to individual contamination values from each
sample spectrum.
11.2 Calculation of reduced mobility:
K=E
-1
1
d
/t
d
and
K
0
= K (p/p
0
) (T
0
/T)
K : ion mobility (cm
2
/Vs)
K
0
: reduced ion mobility (cm
2
/Vs)
p: pressure
p
0
: standard pressure
T : temperature
T
0
: standard temperature (273.15K)
l
d
: drift length (cm)
t
d
: drift time (s)
E : electric field strength (V/cm)
K : Kelvin
11.2.1
Table 1 shows the specified integration range;
all reduced mobility values are given in units of cm
2
/Vs.
11.2.2 The resulting integrals for each spectrum are
summed up for the whole desorption time. This value is
compared to the appropriate value of the reference
sample (HPB or DOP).
11.2.3
This procedure ensures the comparison of the
evaluated sample contamination values between
different laboratories and measurement equipments.
12 Related Documents
12.1 K. Budde, “Application of Ion Mobility
Spectrometry to Semiconductor Technology,”
Proceedings of the Satellite Symposium to ESSDERC
89 (Berlin) of the Electrochemical Society (the
Electrochemical Society Pennington, 1990) PV 90-11,
p.215.
12.2
K. Budde, W. J. Holzapfel, “Measurement of
Organic Contamination from Silicon Surfaces,”
Proceedings, 38th Meeting, Institute of Environmental
Sciences, 3.-8.5.1992, Nashville, TN, p.483.
12.3
K. Budde, W. J. Holzapfel, “Detection of Volatile
Organic Surface Contaminations Arising from Wafer
Boxes and Cleaning Processes,” Proceedings of the
First International Symposium on Semiconductor
Wafer Bonding, (the Electrochemical Society
Pennington, 1992) PV 92-7, p. 271.
12.4
Proposal: SEMATECH Test Method for
Determining Outgassing Products from Semiconductor
Product Carriers.
12.5
S.N. Ketkar, S.M. Penn, and W.L. Fite,
“Influence of Coexisting Analytes in Atmospheric
Pressure Ionization Mass Spectrometry,” Anal. Chem.
63, (1991) 924.
SEMI E46-0301 © SEMI 1995, 2001 6
12.6 R.E. Clement, K.W.M. Siu, and H.H. Hill Jr.,
“Instrumentation for Trace Organic Monitoring,” Lewin
Publishers, Boca Raton 1991.
Table 1 Integration Range for the Evaluation of Ion
Mobility Spectra
Polarity of
Target Ions Sample Background
Signal Range
(sample)
positive HPB 42.10–5.81 0.86–0.77
negative DOP 37.30–7.35 1.99–1.63
positive Sample 42.10–5.81 2.24–0.84
negative Sample 37.30–7.35 2.30–0.91
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer’s instructions, product labels,
product data sheets, and other relevant literature
respecting any materials mentioned herein. These
standards are subject to change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI E47-0301 © SEMI 1995, 20011
SEMI E47-0301
SPECIFICATION FOR 150 mm/200 mm POD HANDLES
This specification was technically approved by the Global Physical Interfaces & Carriers Committee and is
the direct responsibility of the European Equipment Automation Committee. Current edition approved by the
European Regional Standards Committee on October 26, 2000. Initially available at www.semi.org January
2001; to be published March 2001. Originally published in 1995; previously published October 2000.
1 Purpose
1.1 This specification provides a unified form and
location for pod handles to enable automatic pod
handling.
2 Scope
2.1 This specification defines the dimensions and
location of handles on 150 mm/200 mm pod. These
provide automatic handling and take into consideration
manual handling. The design of individual manual
handles is open to be accomplished within the
dimensional limitations of the standard.
2.2 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 This specification applies only to automatic
handling of the pod with a SMIF interface in the
horizontal plane (see limitations of SEMI E19.3 and
E19.4). Dimensional restrictions for manual handling
are given in SEMI E15 and SEMI T4.
4 Referenced Standards
4.1 SEMI Standards
SEMI E15 — Specification for Tool Load Port
SEMI E19.3 — 150 mm Standard Mechanical Interface
(SMIF)
SEMI E19.4 — 200 mm Standard Mechanical Interface
(SMIF)
SEMI E47.1 — Provisional Mechanical Specification
for Boxes and Pods Used to Transport and Store 300
mm Wafers
SEMI T4 — Specification for 150 mm and 200 mm
Pod Identification Dimensions
NOTE 1: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
5 Terminology
5.1 standard mechanical interface (SMIF) — the
interface plane between a pod and another
minienvironment per SEMI E19.
5.2 pod — a box having a Standard Mechanical
Interface (SMIF) per SEMI E19.
5.3 box — a protective portable container for a
cassette and/or substrate(s).
5.4 cassette — an open structure that holds one or
more substrates (wafer, masks, etc.).
5.5 handle of a pod — a mechanical aid designed for
automatic handling of a pod, which may also be used
for manual handling.
5.6 handling area — minimum free space around the
pod for automatic handling.
5.7 handling of a pod — automatic and manual
movement and/or placement of a pod.
5.8 orientation notch — notch located at the pod
handles to allow sensing the orientation of the pod. See
Figure 1.
5.9 position notch — notch located at the center lines
of the pod handles to allow positioning. See Figure 1
(PN1 to PN4).
6 Requirements
6.1 Handling Dimensions: the han dling dimensions for
150 mm and 200 mm pods shall be per Table 1 (see
Figure 1 for dimensional locations).
6.2 A8 is given as a minimum and can be extended up
to A1.
6.3 Number of handles shall be:
6.3.1 four (H1–H4 in Figure 2) or
6.3.2 two (H1 and H3) in Figure 2.
6.4 The handling area is defined by A5 (which is in
reference to A1) and by B2. B1 is the minimum
distance between the interface plane and the nearest
extension of the handle.
6.5 The orientation possibilities of the pod are given in
Figure 2 and Table 2.