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SEMI F21-1102 © SEMI 1995, 2001 4 RELATED INFORMATION 2 EXAMPLE OF AN ANALYSIS REPORT NOTE: This related information is not an o fficial part of SEMI F21 and is not inte nded to modify or supercede the official standard.…
SEMI F21-1102 © SEMI 1995, 2002 3
RELATED INFORMATION 1
SPECIFIC CONTAMINANTS TO MEASURE FOR VERIFICATION OF
ENVIRONMENTAL COMPLIANCE
NOTE: This related information is not an official part of SEMI F21 and is not intended to modify or supercede the official
standard. It has been derived from the work of the originating task force. Publication was authorized by full ballot procedures.
Determination of the suitability of the material is solely the responsibility of the user.
Although it is difficult to compile an inclusive list, the
originating task force recommends that the user test the
air for each of the contaminants listed.
R1-1 Acids
• Hydrofluoric
• Sulfuric
• Hydrochloric
• Nitric
• Phosphoric
• Hydrobromic
R1-2 Bases
• Ammonia (ammonium hydroxide)
• Tetramethylammonium hydroxide
• Trimethylamine
• Triethylamine
• NMP
• Cyclohexylamine
• Diethylaminoethanol
• Methylamine
• Dimethylamine
• Ethanolamine
• Morpholine
R1-3 Condensables
• Silicone (boiling point ≥ 150°C)
• Hydrocarbon (boiling point ≥ 150°C)
R1-4 Dopants
• Boron (usually as boric acid)
• Phosphorous (usually as organophosphates)
• Arsenic (usually as arsenates)
SEMI F21-1102 © SEMI 1995, 2001 4
RELATED INFORMATION 2
EXAMPLE OF AN ANALYSIS REPORT
NOTE: This related information is not an official part of SEMI F21 and is not intended to modify or supercede the official
standard. It has been derived from the work of the originating task force. Publication was authorized by full ballot procedures.
Determination of the suitability of the material is solely the responsibility of the user.
Analysis for compliance with SEMI Standard Classification MA-10:
Site : FAB 3
Test date and duration : 18 August 1994, 0800
–
1700, 9 hours
Contaminants measured : Hydrofluoric acid
1 pptm
Sulfuric acid
1 pptm
Hydrochloric acid 2 pptm
Nitric acid
1 pptm
Phosphoric acid
2 pptm
Hydrobromic acid
1 pptm
Total 8 pptm
Detection Limits : 1 pptm for each analyte
Confidence Level :
95%
Assumptions made : All acids determined as anions after water scrubbing;
anions can be from other sources but are assumed to
be in the acid form for reporting purposes.
Conclusion :
This environment meets the MA -10 criterion in
SEMI F21.
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for
any particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant
literature respecting any materials mentioned herein. These standards are subject to change without notice.
The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted
material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI F22-1102 © SEMI 1997, 2002 1
SEMI F22-1102
GUIDE FOR GAS DISTRIBUTION SYSTEMS
This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the
North American Facilities Committee. Current edition approved by the North American Regional Standards
Committee on July 21, 2002. Initially available at www.semi.org October 2002; to be published November
2002. Originally published June 1997.
1 Purpose
1.1 This reference document is intended to outline for
the user the common systems configurations,
components, and subcomponents of high purity gas
distribution systems in a semiconductor fabrication
facility. Related specifications are also noted.
2 Scope
2.1 Outlined in this document are both bulk and
specialty gas distribution systems.
2.2 Components and subcomponents are identified
from the point-of-supply to the point-of-connection to
the process tool.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety health practices and determine the
applicability or regulatory limitations prior to use.
3 Limitations
3.1 The gas distribution system configurations noted in
this reference document are provided solely as a guide
to indicate common industry practice. They are not
presented as, or intended to be, a representation of best
engineering practice.
3.2 The reference documents noted are provided for
general guidance only and are not intended to portray a
code compliance protocol. The users should always
consult local authorities to determine specific
applicable codes and regulations. Agencies, regulatory
or otherwise, noted herein are representative only of the
U.S.
3.3 Specifications, SEMI Standards or other, are noted
to assist the user as a reference only.
4 Referenced Standards
None.
5 Terminology
5.1 Acronyms and Abbreviations
5.1.1 AOV — Air-operated valves
5.1.2 ASO — Automatic shutoff valve
5.1.3 POC — Point of connection
5.1.4 POU — Point of use
5.1.5 VMB — Valve manifold box
5.2 Definitions
5.2.1 air-operated valves (AOV) — are those which
require pneumatic energy to initiate or terminate flow
or to change flow path (e.g., normally closed, partially
open, double acting).
5.2.2 automatic shutoff valve (ASO) — a mechanically,
electrically, or pneumatically activated valve which has
the sole purpose of terminating flow if a predetermined
condition is exceeded. For cryogenic supply systems,
ASO’s are used in conjunction with a low temperature
sensing device.
5.2.3 check valve — a mechanical gas system
component which prevents reverse flow.
5.2.4 effluent treatment system — a device which,
through mechanical, chemical, cryogenic, absorbent, or
other means, abates hazardous gas effluent to
“environmentally safe levels” through dilution,
neutralization, entrapment, or distillation.
5.2.5 excess flow device — a mechanical or electrical
component which senses and signals an AOV or itself
to terminate flow in the event predetermined flow is
exceeded.
5.2.6 face seal fitting — a high purity fitting which
incorporates two machined faces and a metallic gasket
within a male/female nut configuration to attain a high
leak integrity seal.
5.2.7 filter — a porous device, generally constructed of
polymer, metal, or ceramics and housed in a metal
chamber, which traps particles, preventing them from
being transported downstream.
5.2.8 flow restrictor — a component, generally an
orifice, which prohibits gas flow beyond a
predetermined flow.
5.2.9 gas box — a gas distribution subsystem which
generally contains the final shut-off valve(s) prior to the
POC. It may also contain filter(s) and a regulator.
5.2.10 hazardous gas detectors — analytical
instruments which placed in strategic locations in and