semi合集-English.pdf - 第4619页
SEMI IN TERNA TIONA L STANDA RDS GASES Sem iconduct or Equipm ent and Materials Inte rnational
SEMI D42-0305 © SEMI 2005 3
Symbol
Used
Definition Specification
H1 Bottom surface of mask substrate to the inside
of the case body
50 mm
H2 Top of mask substrate to the top of the case
body
10 mm , 15mm
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SEMI INTERNATIONAL STANDARDS
GASES
Semiconductor Equipment and Materials International
SEMI C3-0699 © SEMI 1986, 19991
SEMI C3-0699
SPECIFICATIONS FOR GASES
IMPORTANT NOTICE: This specification is incomplete. The incomplete sections are noted as “To Be Determined.”
The Gases Committee has agreed to publish this section prior to completion as a service to the Semiconductor
Industry.
This specification was technically approved by the Global Gases Committee and is the direct responsibility of
the North American Gases Committee. Current edition approved by the North American Regional Standards
Committee on February 28, 1999. Initially available at www.semi.org April 1999; to be published June
1999. Originally published in 1986; previously published in 1995.
1 Preface
1.1 Recognizing the importance of impurity content of
gases in the manufacture of semiconductors, suppliers
responded by introducing products with improved
analytical characterization, notably for trace impurities.
1.2 The SEMI Gases Committee b egan its efforts in
the spring of 1979. With this publication, the
Committee establishes the definitions, general
procedures, specifications, and analytical procedures
for the gases listed in the index.
1.3 Products which meet all of the requirements may
be described as “meeting SEMI specifications.”
1.4 Where an analytical procedure different from that
provided is substituted by a supplier or user, the burden
of proof is on said supplier or user to confirm the
equivalency. It should be noted that the following list of
criteria was considered when determining the specified
analytical method.
Reliability
Ease of Use
Maintenance
Precision
Accuracy
Sensitivity
Versatility
Availability of Equipment
1.5 The specifications provided by this work are
intended to serve for gases to be used in the
manufacture and processing of semiconductors and
advanced electronic devices and circuits. The
specifications and the associated test procedures are
guidelines based on the experience of suppliers and
users. The function of the specifications is to establish
desired standards of quality.
1.6 Where feasible, a specification of content shall be
expressed as a numerical limit in units of mole per mole
(mole/mole).
1.7 For a major component, the value (assay or purity)
shall be expressed as a minimum permissible limit. For
an impurity, the value shall be expressed as a maximum
permissible limit.
1.8 A gas conforming to the specifications will
commonly contain more of the major component than
the minimum permissible limit or contain less of an
impurity (or several impurities) than the SEMI C3
maximum permissible limit. In neither case shall the
gas be considered as of higher quality than that defined
by the specification.
1.9 It is not practical to consider e very impurity or
contaminant that might be present. For certain
applications, it is recognized that more stringent or
additional specifications and procedures might be
required. The intent of these specifications and the
associated procedures is, on one hand, to assure that a
gas is suitable for the common uses to which it may be
put in the manufacture and processing of semiconductor
devices and, on the other hand, to be consistent with
contemporary manufacturing processes for that gas.
1.10 The Committee is continuing work on
improvement of specifications and procedures and
addition of other gases and systems such as mixed
gases. The Committee welcomes comments,
suggestions, and recommendations.
2 Definitions
2.1 Abbreviations and Symbols — In this work,
abbreviations and symbols used shall be restricted to
those listed in Table 1.
Table 1 Abbreviations and Symbols
Abbreviation or
Symbol
Explanation
ASTM American Society for Testing and
Materials
atm atmosphere
BP Boiling point
°C temperature, degrees Celsius