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SEMI P10-0705 © SEMI 1990, 2005 152 RELATED INFORMATION 1 CRITICAL DIMENSION KEYWORDS NOTICE : This rel ated infor mation is not an official part of SEMI P10 and was derived f rom the Nort h American Microlithography Com…

SEMI P10-0705 © SEMI 1990, 2005 151

8.1.810 WAFER_EXPOSURE_SIGMA_OUTER — Outer partial coherence of the scanner, stepper or aligner on

which the mask is to be used. (This is a unitless parameter.)

8.1.811 WAFER_EXPOSURE_TOOL — Alphanumeric brand and model of the scanner, stepper or aligner on

which the mask is to be used.

8.1.812 WAFER_FAB — (text) Identification of the customer’s wafer fab at which the mask(s) are intended to be

used.

8.1.813 WAIVER — The uniquely identified (for each customer) document which describes specifications which

may be ignored by the vendor.

8.1.814 WAIVER_OVERRIDE — The uniquely identified (for each customer) document which describes

specifications which usually may be ignored by the vendor, but in this case may NOT be ignored by the vendor.

This keyword cancels the effect of the waiver only within the scope of its application in <mask_order>.

8.1.815 WEB_ADDRESS — URL address.

8.1.816 WRITE_DATE_TIME — Date and time at which mask exposure began on the lithography tool.

9 Computing the Checksum

9.1 The cyclic checksum is computed as follows:

9.1.1 Initialize the 16 bit checksum value to zero. Consider all the records in the data file from START_ORDER

through END_ORDER, inclusive. Consider each ASCII character up to and including the “new_line” character.

Convert each character to its ASCII numeric equivalent (e.g., space is 32 decimal, “A” is 65 decimal, etc.) Use the

value 10 decimal for the new_line function regardless of its internal representation (e.g., CR LF). Use only the 7 bit

ASCII representation for each character (i.e., ignore the high order bit in an 8 bit byte).

9.1.2 XOR each of the characters from each of the records in sequence, from the first character in the

START_ORDER record to the new_line character in the END_ORDER record. Before each character is XORed

with the checksum, circularly rotate the previous value of the accumulated 16 bit checksum one bit to the left.

9.1.3 After all of the above characters have been accumulated into the checksum, convert it as an unsigned 16 bit

integer into the ASCII representation of its decimal value. This ASCII string is the data field following the

CHECKSUM keyword, the last record in the mask order structure.

SEMI P10-0705 © SEMI 1990, 2005 152

RELATED INFORMATION 1

CRITICAL DIMENSION KEYWORDS

NOTICE: This related information is not an official part of SEMI P10 and was derived from the North American

Microlithography Committee. This related information was approved for publication by full letter ballot on

April 22, 2004.

CD_TOLERANCE — Maximum acceptable deviation of the mean of all measured critical

dimensions to the CD_TARGET

CD_RANGE — Maximum acceptable variation of all measured critical dimensions of same

nominal size, same tone and same orientation, relative to each other.

CD_DEVIATION_FROM_MEAN — Maximum acceptable deviation of any of the customer-

required CD measurements from the mean of those measurements.

Mean Target

SEMI P10-0705 © SEMI 1990, 2005 153

CD_DEVIATION_FROM_TARGET — Maximum acceptable deviation of any of

the customer-required CD measurements from the CD_TARGET.

If only one data value (p) appears in the data field, the tolerance is considered +/-

symmetrically about CD_TARGET.

If two data values ( p [,m] ) appear, then the first is the maximum amount by

which deviation is allowed larger than CD_TARGET, and the second is the

maximum amount by which deviation is allowed smaller than CD_TARGET. The

comma and second half of the argument are optional in the syntax (p[,m]) where

p = the plus and m = the minus value for non-symmetric tolerances; if only p is

specified, the plus and minus values are assumed to be symmetric.

CD_THREE_SIGMA — Maximum acceptable 3-sigma deviation of all measured

critical dimensions to the the mean of all measured critical dimensions

CD_XY_DEVIATION — Maximum deviation, on a site-by-site basis, of a

horizontal critical dimension to a vertical critical dimension. The two critical

dimensions at each site must be the same size in the pattern data and the

same tone on the mask.

CD_XY_TOLERANCE — Maximum acceptable deviation of the mean of all

measured horizontal critical dimensions to the mean of all measured vertical

mask critical dimensions. Critical dimensions at all sites must be the same size in

the pattern data.

Distribution of

vs Y

Horizontal Vertical