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SEMI P10-0705 © SEMI 1990, 2005 133 8.1.427 MEASURED_REGISTR_MINIMUM — (x,y ) Measu red minimum error of all registration m easurements in both x and y. Note that the locatio n of the minimum in x is probab ly not at the…

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SEMI P10-0705 © SEMI 1990, 2005 132
8.1.408 MEASURED_ETCH_DEPTH_MARK_SITE_ID — Must match ETCH_DEPTH_MARK_SITE_ID in
<mask_order> for site being measured. If the customer assigned no ETCH_DEPTH_MARK_SITE_ID for the
required location (e.g., only ETCH_DEPTH_MARK_LOCATION_DRAWING was used), the vendor will assign a
MEASURED_ETCH_DEPTH_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.409 MEASURED_ETCH_DEPTH_RANGE — ETCH_DEPTH_RANGE as measured by the vendor.
8.1.410 MEASURED_ETCH_DEPTH_TOLERANCE — ETCH_DEPTH_TOLERANCE as measured by the
vendor. If the mean etch depth is greater than the target, then reported value will be positive; if the mean etch depth
is less than the target, then reported value will be negative.
8.1.411 MEASURED_HORIZONTAL_CD — Measured value of horizontal critical dimension.
8.1.412 MEASURED_PERCENT_CLEAR — PERCENT_CLEAR as computed by the vendor.
8.1.413 MEASURED_PERCENT_DEFECTIVE_DIE — PERCENT_DEFECTIVE_DIE as measured by the
vendor.
8.1.414 MEASURED_PHASE_ANGLE — Phase angle as measured at a single site.
8.1.415 MEASURED_PHASE_ANGLE_AVERAGE — Mean of all customer-specified phase angle measurement
sites.
8.1.416 MEASURED_PHASE_ANGLE_ERROR — PHASE_ANGLE_ERROR as measured by the vendor.
8.1.417 MEASURED_PHASE_ANGLE_MARK_SITE_ID — Must match PHASE_ANGLE_SITE_ID in
<mask_order> for site being measured. If the customer assigned no PHASE_ANGLE_SITE_ID for the required
location (e.g., only PHASE_ANGLE_MARK_LOCATION_DRAWING was used), the vendor will assign a
MEASURED_PHASE_ANGLE_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.418 MEASURED_PHASE_ANGLE_RANGE — PHASE_ANGLE_RANGE as measured by the vendor.
8.1.419 MEASURED_PHASE_ANGLE_TOLERANCE — PHASE_ANGLE_TOLERANCE as measured by the
vendor. If the mean phase angle is greater than the target, then reported value will be positive; if the mean phase
angle is less than the target, then reported value will be negative.
8.1.420 MEASURED_REGISTR_CLOSURE — (x,y) REGISTR_CLOSURE as measured by the vendor in both
axes.
8.1.421 MEASURED_REGISTR_ERROR — REGISTR_ERROR as measured by the vendor. This is the
maximum registration deviation (positive or negative in either X or Y) of any measured registration mark.
8.1.422 MEASURED_REGISTR_FILE_NAME — Name of data file containing results of registration
measurement.
8.1.423 MEASURED_REGISTR_MARK_ERROR — (x,y) Registration error of an individual mark.
8.1.424 MEASURED_REGISTR_MARK_ID — Must match REGISTR_MARK_ID in <mask_order> for site
being measured. If the customer assigned no REGISTR_MARK_ID for the required location (e.g., only
MEASURE_FILE_NAME was used), the vendor will assign a MEASURED_REGISTR_MARK_ID for each
measurement location so that it is unique within the MASK_SET_ID. If REGISTR_MARK_ID was used as a
<pattern_options> in <mask_order> for a pattern with multiple instances, then the vendor will add a suffix to
REGISTR_MARK_ID for each instance so that each MEASURED_REGISTR_MARK_ID in <mask_results> will
be unique.
8.1.425 MEASURED_REGISTR_MARK_LOCATION — (x,y) Location of individual registration mark, relative
to nominal center of substrate (chrome side up), as measured by the vendor. This is the location of the mark as
measured by the vendor.
8.1.426 MEASURED_REGISTR_MARK_RESIDUAL — (x,y) Registration error of an individual mark after
removing scale and orthogonality.
SEMI P10-0705 © SEMI 1990, 2005 133
8.1.427 MEASURED_REGISTR_MINIMUM — (x,y) Measured minimum error of all registration measurements
in both x and y. Note that the location of the minimum in x is probably not at the same location as the minimum in
y.
8.1.428 MEASURED_REGISTR_MAXIMUM — (x,y) Measured maximum error of all registration measurements
in both x and y. Note that the location of the maximum in x is probably not at the same location as the maximum in
y.
8.1.429 MEASURED_REGISTR_ORTHO — REGISTR_ORTHO as measured by the vendor.
8.1.430 MEASURED_REGISTR_RELATIVE — REGISTR_RELATIVE as measured by the vendor.
8.1.431 MEASURED_REGISTR_RESIDUAL — (x,y) REGISTR_RESIDUAL as measured by the vendor.
8.1.432 MEASURED_REGISTR_RESIDUAL_THREE_SIGMA — (x,y)
REGISTR_RESIDUAL_THREE_SIGMA as measured by vendor.
8.1.433 MEASURED_REGISTR_SCALE — (x,y) REGISTR_SCALE as measured by the vendor.
8.1.434 MEASURED_REGISTR_THREE_SIGMA — (x,y) REGISTR_THREE_SIGMA as measured by vendor.
8.1.435 MEASURED_REGISTR_TOLERANCE — (x,y) The mean measured registration error in both x and y.
Deviations for which the measured location is to the right or above the reference grid or reference mask are
considered positive; measured locations to the left or below the reference grid or reference mask are considered
negative.
8.1.436 MEASURED_TRANSMISSION — Phase shift transmission as measured at a single site.
8.1.437 MEASURED_TRANSMISSION_AVERAGE — Mean of all customer-specified transmission
measurement sites.
8.1.438 MEASURED_TRANSMISSION_ERROR — TRANSMISSION_ERROR as measured by the vendor.
8.1.439 MEASURED_TRANSMISSION_MARK_SITE_ID — Must match TRANSMISSION_MARK_SITE_ID
in <mask_order> for site being measured. If the customer assigned no TRANSMISSION_MARK_SITE_ID for the
required location (e.g., only TRANSMISSION_MARK_LOCATION_DRAWING was used), the vendor will assign
a MEASURED_TRANSMISSION_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.440 MEASURED_TRANSMISSION_RANGE — TRANSMISSION_RANGE as measured by the vendor.
8.1.441 MEASURED_TRANSMISSION_TOLERANCE — TRANSMISSION_TOLERANCE as measured by the
vendor. If the mean transmission is greater than the target, then reported value will be positive; if the mean
transmission is less than the target, then reported value will be negative.
8.1.442 MEASURED_VERTICAL_CD — Measured value of vertical critical dimension.
8.1.443 MFG_BIAS_PREAPPLIED — Amount (in microns, prior to scaling) of sizing pre-applied by the customer
to support mask processing of CD_DATA to achieve CD_TARGET. A negative MFG_BIAS_PREAPPLIED
indicates that the digitized geometry has been made smaller.
8.1.444 MFG_SITE_REQD — Alphanumeric identification of qualified manufacturing sites, to be agreed between
customer and vendor. For a given MASK_ID, MFG_SITE_REQD may not be used in combination with
EQUIP_SITE_REQD.
8.1.445 MFG_SITE_USED — Alphanumeric identification of manufacturing site used, to be agreed between
customer and vendor.
8.1.446 MILESTONE — (ORDER_RECEIVED, ORDER_ACCEPTED, DATA_PREPARED,
MASK_WRITTEN, CDS_MEASURED, REGISTR_MEASURED, DEFECTS_REPAIRED,
PELLICLES_APPLIED, POST_PELLICLE_INSPECTION, SHIPPED, DELIVERED, ON_HOLD, OFF_HOLD)
notifies the customer that the MASK_ID has passed the indicated processing step, or is on hold.
8.1.447 MILESTONES — (T or F) If T, the vendor is requested to use <mask_results> (see §7.5) to notify the
customer each time the mask completes a significant processing step. Within this standard, these significant steps
SEMI P10-0705 © SEMI 1990, 2005 134
are limited to those defined under MILESTONE. MILESTONES may not be used in combination with
PERIODIC_UPDATES for the same MASK_ID.
8.1.448 MIN_CORNER_TO_CORNER_GAP — Smallest (scaled) corner-to-corner spacing of any features
included in any customer-supplied pattern data on the mask.
8.1.449 MIN_MASK_FEATURE_SIZE — Smallest (scaled) feature included in any customer-supplied pattern
data on the mask.
8.1.450 MINIMUM_FEATURE_LOCATION — Location of a minimally sized feature within the pattern file,
relative to the center of the pattern, unscaled and unmirrored.
8.1.451 MINIMUM_FEATURE_SIZE — Smallest (unscaled) feature included in pattern data, excluding OPC data
which is identified under OPC_MINIMUM_FEATURE_SIZE.
8.1.452 MIRROR — (HORIZONTAL or VERTICAL) Axis around which to invert the data image.
8.1.453 MIRROR_MASK — (T or F) All patterns and titles must be mirrored about the vertical axis, to be applied
in addition to all other positioning information.
8.1.454 MIRROR_PATTERN — (T or F) If T, the pattern file (or cell) is to be mirrored about its vertical axis. If
used in conjunction with MIRROR_MASK, the result will be unmirrored pattern data while all other data will be
mirrored.
8.1.455 MIRROR_TITLE — (T or F) If T, TITLE_TEXT is to be mirrored about the vertical axis. If used in
conjunction with MIRROR_MASK, result will be an unmirrored title with all other data mirrored (chrome side up).
8.1.456 MULTIWRITE — (x,y) If present as a mask option, then the MASK_ID represents only one writing
operation for a mask which requires multiple write and process cycles (defined within the <mask_group>) before the
final mask is completed. All MASK_IDs used to make the final mask must have MULTIWRITE as a
<mask_option> and must designate the same integer group number (x). Such a final mask will be built with a
specified integer sequence (y) of MASK_IDs. Sequence numbers may never be less than 1 nor more than the
number of write and process cycles specified in the order, except that zero may be used where the sequence is
arbitrary. A sequence number within a group may not be repeated (except zero).
8.1.457 MULTIWRITE_REF_MASK_ID — Within the MULTIWRITE numerical group, this is the MASK_ID to
which overlay error should be measured.
8.1.458 NUMBER_OF_CDS — The integer number of CD locations to be measured. If sufficient specific sites are
not explicitly identified by the customer, the vendor is free to select additional similar sites.
8.1.459 OPC_MINIMUM_FEATURE_SIZE — For the OPC_TYPE being described, the size of the smallest
(unscaled) OPC feature in the pattern data.
8.1.460 OPC_MINIMUM_GAP — For the OPC_TYPE being described, the size of the smallest (unscaled) gap in
the pattern data between OPC features of the same type.
8.1.461 OPC_PATTERN_MODIFIABLE — (T or F) If F, the pattern may not be modified (biased) by the mask
shop for printability or CD linearity improvement. In this case, the need for such biasing must have been anticipated
by the customer.
8.1.462 OPC_PATTERN_SEPARATE — (T or F) If T, then the pattern being described is only the OPC portion of
what will be written on the mask. Depending upon the write tool methodology, the pattern may need to be merged
off-line with other patterns. This may allow mask shop biasing for printability or CD linearity unless precluded by
OPC_PATTERN_MODIFIABLE = F.
8.1.463 OPC_TYPE — (CLEAR_SERIF, CLEAR_HAMMERHEAD, CLEAR_ASSIST_BAR, OPAQUE_SERIF,
OPAQUE_HAMMERHEAD, OPAQUE_ASSIST_BAR, JOG, PILLAR, HOLE) (Linewidth biasing is not included
as an OPC type.)
8.1.464 OPERATOR — (text) Mask supplier identification of employee who completed the photomask
requirements for the given operation.