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SEMI F30-0298 © SEMI 1998 4 A P PENDIX 1 NOT E: This a ppendix w as approve d as a n off icial part of SEMI F30 by full letter ballot procedure. Parti al List of Anal ytical Equi pment for Use in Oxygen Servi ce Impur it…

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SEMI F30-0298 © SEMI 19983
12 Preparation of Apparatus
12.1 Sampling System — Use appropriate clean tubing
and fittings, or clean before use. Purge system prior to
sampling.
12.2 Dynamic Dilution System — Use certified
standards and dilute using equation (1) to calculate final
concentration (C
F
). For moisture, certified moisture
permeation devices can be used.
(1) C
c
× D.F. = C
F
C
c
= PPM - or PPB - certified cylinder standard concentration.
C
F
= final concentration.
D.F. = dilution factor which is calculated by taking the
flow (in liters) of the certified standard and dividing
by total flow (in liters). Dilution factors can be
multiplied in series, if diluting more than once.
Example 1: What is the final concentration for
dynamically diluting 10 ml of a 100 PPB impurity into
1 liter?
100 PPB × [0.010 liter/1.010 liter] = 0.99 PPB
12.2.1 Calibration should be done in the region
specified by the purifier manufacturer. For example, if
the purifier has an outlet impurity guarantee of 1 PPB
of each impurity, then the test equipment should be
calibrated with levels at approximately 1 PPB, not at 30
PPB and extrapolated down. Also, multipoint
calibration data is preferred.
12.3 APIMS, RGD-GC, ultratrace analytical
instrumentation. Particle counter.
12.3.1 Start-up and purge the instrumentation. Perform
calibration. Determine if calibration is satisfactory.
Proceed to sampling section.
12.4 Data Collection System — Check for proper
signal inputs, range inputs, and sampling intervals.
12.5 Data Reduction System — Prepare data as print-
outs and/or graphs. Include statistical analysis as
required. Generate final report.
13 Calibration and Standardization
13.1 See Section 12, Preparation of Apparatus.
14 Procedure
14.1 Trace Gas Impurity Measurement
14.1.1 Connect sample source to analytical equipment.
14.1.2 Start data collection.
14.1.3 Stop sampling. Review preliminary data. If it is
within customer specification, disconnect sample
source. If it does not meet specifications, investigate
cause or refer to manufacturer literature to resolve.
Once condition is corrected, repeat tests.
14.1.4 Repeat procedure for next bed or sampling
point. If instrumentation is relocated, calibration check
is required.
14.2 Particle Counting
14.2.1 Select sample location. Ideal location is a
permanently installed pitot probe.
14.2.2 Select where the particle tests will be done on
the pipe.
14.2.3 Use Reynold’s equation to determine the
required gas rate for turbulent flow to the particle
counter. Use this value or higher for sampling purposes.
Reynold’s number greater than 2100 are suggested for
turbulent flow.
14.2.4 Reduce incoming sample pressure to the
particle counter by following manufacturer’s
recommendation or by best practice.
14.2.5 Test particles with turbulent flow through
pipeline, if possible. However, do not exceed the
manufacturer’s maximum rated flow for the purifier.
14.2.6 Start data collection.
14.2.7 Stop sampling. Review preliminary data. If it is
within customer specification, disconnect sample
source. If it does not meet specifications, investigate
cause or refer to manufacturer’s literature to resolve.
Once condition is corrected, repeat tests.
14.2.8 Repeat procedure for next bed or sampling
point.
15 Calculations or Interpretation of Results
15.1 Results are interpreted by trending analysis,
averaging, or steady-state analysis.
16 Reporting Results
16.1 Sample location.
16.2 Operator identification.
16.3 Test parameters and conditions (pressures,
flowrates, temperatures, etc.).
16.4 Test date and duration.
16.5 Description of instrumentation.
16.6 Calibration information for analyzer(s).
16.7 Report test results by data table and/or graphs.
16.8 Comments on testing.
16.9 Conclusion.
SEMI F30-0298 © SEMI 1998 4
APPENDIX 1
NOTE: This appendix was approved as an official part of SEMI F30 by full letter ballot procedure.
Partial List of Analytical Equipment for Use in Oxygen Service
Impurity Analytical Equipment
H
2
O Dewpoint Detection
Electrolytic
Peizoelectric
Capacitance (aluminum oxide, silicon array)
Fourier Transform Infrared (FTIR)
CH
4
, Total Hydrocarbons,
Nonmethane Hydrocarbons
Flame-Ionization Detector-Gas Chromatograph (FID-GC)
Discharge Ionization Detector (DID)-GC
CO Reduction Gas Detector (RGD)-GC
Nondispersive Infrared (NDIR)
DID-GC
CO
2
Methanator on FID-GC
DID-GC
NDIR
H
2
RGD-GC
Particles Special counters required for O
2
service:
for 0.01 µ or greater, condensation nucleus counter
for 0.1 µ or greater, laser counter
NOTICE: These standards do not purport to address safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish appropriate safety and health practices and determine the
applicability of regulatory limitations prior to use. SEMI makes no warranties or representations as to the suitability
of the standards set forth herein for any particular application. The determination of the suitability of the standard is
solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels,
product data sheets, and other relevant literature respecting any materials mentioned herein. These standards are
subject to change without notice.
The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted
material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI F31-0698 © SEMI 19981
SEMI F31-0698
GUIDE FOR BULK CHEMICAL DISTRIBUTION SYSTEMS
1 Purpose
1.1 This guide defines components of Bulk Chemical
Distribution Systems and sets forth Basic Design
Elements and optional design features common to BCD
Systems.
2 Scope
2.1 This guide applies to BCD Systems used in
semiconductor manufacturing facilities for supplying
liquid chemicals to wafer cleaning and other
manufacturing processes.
3 Limitations
3.1 This guide is not intended to be applicable to every
possible use and type of chemical dispensing system
but only to those systems that originate with sources of
single lots of liquid materials of 55 gallons or more, and
which operate in a way that splits a single liquid stream
into multiple streams. This guide excludes slurry
systems, small liquid chemical dispensing systems,
chemical waste systems, and many other types of
systems that dispense fluids.
3.2 This guide excludes construction protocols for
BCD Systems, such as clean manufacturing practices,
integrity of fabrication, and prequalification of
materials.
3.3 This guide does not intend to cover all the
important safety considerations which relate to Bulk
Chemical Distribution Systems.
3.4 References to “containers” in this document are
not limited to “Bulk Containers” as defined in the Code
of Federal Regulations (CFR) Section 49 or Department
of Transportation (DOT) Regulations.
4 Referenced Documents
NOTE: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
4.1 SEMI Standards
SEMI E49 — Guide for Standard Performance,
Practices, and Sub-Assembly for High Purity Piping
Systems and Final Assembly for Semiconductor
Manufacturing Equipment
SEMI S2 — Environmental, Health, and Safety
Guideline for Semiconductor Manufacturing Equipment
4.2 DOT
1
Department of Transportation
4.3 Federal Regulations
2
49 CFR — Title 49 of the Code of Federal Regulations
5 Terminology
5.1 Acronyms
5.1.1 CDM — Chemical Dispensing Module
5.1.2 CDU — Chemical Dispensing Unit
5.1.3 DIW — Deionized Water
5.1.4 MDU — Modular Dispensing Unit
5.2 Definitions
5.2.1 blending — Combination of two or more
chemicals to create a mixture which contains a desired
ratio of constituents.
5.2.2 chemical dispense system — The module used
for filtering and for dispensing chemical into the
distribution piping network which may be referred to by
a number of manufacturer’s specific designations:
CDM, CDU, and MDU.
5.2.3 chemical reprocessing unit — A subsystem
which purifies or recycles a chemical.
5.2.4 chemical transfer — The technique used to
move chemical between different points in the
distribution system.
5.2.4.1 pressurization — The use of high purity
nitrogen or other appropriate gas to displace liquid
through the distribution system.
5.2.4.2 pumping — A mechanical or pneumatically
operated technique used to create hydraulic force in the
system.
5.2.4.3 hybrid system — A combination of
pressurization and pumping techniques used to transfer
chemical.
5.2.5 day tank — A vessel that stores that amount of
chemical which may be consumed within one or more
days. This holding vessel usually stores prefiltered
1 Department of Transportation, 400 Seventh Street, SW,
Washington, D.C. 20590
2 United States Government Printing Office, Washington, D.C. 20402