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SEMI F41-0699 © SEMI 1999 1 SEMI F41-0699 GUIDE FOR QUALIFICATION OF A BULK CHEMICAL DISTRIBUTI ON SYSTEM USED IN SEMICONDUCTOR PROCESSING This G uide was technic ally approv ed by the G lobal Facilitie s Com mittee and …
SEMI F40-0699 © SEMI 19997
Table 2 Material Requirements for Bulk Analysis
Inorganics FTIR Thermal
Analysis
Water
Absorption
Weight (gms) 1–2 < 5 0.007–0.01 10
Detection
Limit
0.1 ppm N/A N/A 0.1%
Table 3 Reporting Units for Aqueous Liquid Components
Test Method Aqueous Liquid Component Reporting Units
Leachable Trace Inorganics,
Anions, TOC
tubing, piping, valves, regulators, fittings,
gaskets, O-rings, filter housings
µg/cm
2
Bulk Trace Inorganics
tubing, piping, valves, regulators, fittings,
gaskets, O-rings, filter housings
µg/cm
2
Nonvolatile Residue tubing, piping, valves, regulators, fittings,
gaskets, O-rings, filter housings
µg/cm
2
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer’s
instructions, product labels, product data sheets, and
other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI F41-0699 © SEMI 19991
SEMI F41-0699
GUIDE FOR QUALIFICATION OF A BULK CHEMICAL DISTRIBUTION
SYSTEM USED IN SEMICONDUCTOR PROCESSING
This Guide was technically approved by the Global Facilities Committee and is the direct responsibility of
the North American Facilities Committee. Current edition approved by the North American Regional
Standards Committee on December 18, 1998. Initially available on www.semi.org January 1999; to be
published June 1999.
1 Purpose
1.1 This Guide sets forth a logical and systematic
approach to the qualification of a Bulk Chemical
Distribution System that may be used by users and
suppliers as a basis for developing site-specific BCDS
specifications and performance criteria.
2 Scope
2.1 The qualification process includes evaluation of
chemical from the chemical source, the fluid transfer
system, the distribution piping, the day tank, as well as
other intermediary points of transfer and storage that
may be included in the qualification plan.
2.2 This guide assumes that the BCDS has been
installed per the BCDS manufacturer's
recommendations and the customer's specifications, and
has been appropriately leak tested and shown to meet
all requirements of mechanical and physical integrity up
to the POU.
2.3 BCDS are typically tested for particle levels and
trace metal impurities according to specified levels
agreed upon in advance. For certain applications or
specific chemicals, other testing may become
incorporated in the qualification process. These other
tests may include assay analysis, anion analysis, TOC
analysis, moisture analysis, etc.
3 Limitations
3.1 This guide does not define the test methods that
should be used for evaluation of samples taken during
the qualification process, or distinguish test methods
that will generate accurate and reliable results from
those that will not generate accurate or reliable results.
3.2 This guide does not define or describe the
sampling methodologies that are required in order to
physically take a representative and a non-contaminated
batch sample. However, appropriate sampling
procedures and equipment must be used consistent with
the actual specifications.
3.3 This guide does not define the type of containers
that should be used for sampling. Pretreatment of
containers is necessary to assure that the data generated
by testing actually measures the chemical being
delivered to the process tool and not the impurities in
the container itself, from the environment, or from
human handling.
3.4 This guide does not address the type, level, or
frequency of testing necessary and appropriate for
ongoing monitoring of a BCDS.
3.5 This guide does not address the special case of a
system designed and used for the generation and
distribution of high purity water used in semiconductor
processing.
3.6 This guide does not address the testing and
prequalification of materials, subassemblies, or
components used in a BCDS.
3.7 This guide does not address the protocols and
requirements defined by the manufacturer concerning
the installation of the BCDS.
3.8 This guide does not define the actual specifications
generally negotiated between the user and the
manufacturer of the BCDS, against which chemical
samples are tested and qualification is passed.
3.9 This guide does not address the qualification
process for chemicals through the process tool. While
the sampling considerations and timing make the initial
tool qualification a natural adjunct to the BCDS
qualification, the responsibility for this task generally
falls within a different jurisdiction and is generally
handled separately.
4 Referenced Documents
4.1 SEMI Documents
4.1.1 SEMI S-2 — Safety Guideline for
Semiconductor Manufacturing Equipment
4.1.2 SEMI E-4 — Guide for Standard Performance,
Practices, and Sub-Assembly for High Purity Piping
Systems and Final Assembly for Semiconductor
Manufacturing Equipment
4.1.3 SEMI F31 — Guide for Bulk Chemical
Distribution Systems
4.2 Other Document
SEMI F41-0699 © SEMI 1999 2
4.2.1 SIA National Technology Roadmap For Process
Chemicals
1
5 Terminology
5.1 Acronyms and Abbreviations
5.1.1 BCDS — Bulk Chemical Distribution System
5.2 Definitions
5.2.1 pickling — To condition the BCDS by exposing
to an aggressive chemical that extracts impurities from
the internal surfaces of the system.
5.2.2 sample — Sample taken from a system into a
sampling container and measured off-line.
6 Pre-Chemical Qualificatio n
6.1 Advantage of Pre-Chemical Qualification — The
pre-chemical qualification is designed to ensure that the
piping systems and storage tanks are able to accept
chemicals. This step is often initiated after the UPW
system is functional and an acceptable resistivity is
achieved but before chemicals are authorized to be
brought on-site. Although UPW does not extract high
levels of metallic and ionic impurities from the BCDS
materials of construction, this step can ensure that the
BCDS and distribution piping is free of any gross
contamination that may have been introduced into the
system during installation. In addition, the UPW flush
can be effective for the elimination of some types of
particles.
6.2 Particle Qualification The BCDS is flushed
with UPW and the levels of particles are measured
using an on-line optical particle counter. The steps
followed include:
6.2.1 Install an acceptable UPW water filter element(s)
per the filter and BCDS manufacturer's specifications.
6.2.2 Fill the BCDS with UPW and recirculate
internally to ensure that all piping is filled with UPW.
6.2.3 Begin sampling to a liquid particle counter
downstream of the filters either at the outlet of the
BCDS, the POU, or both. Follow an approved particle
counting sampling procedure.
6.2.4 Continue recirculating and flushing until the
particle concentrations in the desired channel or
channels are observed at levels below the agreed-upon
specification. An example of typical specification is the
average of five consecutive ten minute readings of <X
particles/ml @ ≥ Y micron.
1
Semiconductor Industry Association, 181 Metro Drive, Ste 150, San Jose, CA
95110, USA
6.3 Metallic Qualification After reaching the
particle specification for the UPW, a sample of UPW
may be taken for trace metal analysis. This sample can
be taken at the outlet of the BCDS, at an end point
sample station and/or at the POU. An appropriate
sample bottle precleaned for this test should be used to
collect a sample. The sample bottle should be
preconditioned before use and contamination-free
techniques used for the actual sampling.
6.3.1 The steps to follow are:
6.3.1.1 Fill the sample bottle with the required volume
for the analytical method to be used. The volume varies
depending on analytical procedures and lab
instrumentation.
6.3.1.2 Send samples to a designated laboratory
capable of performing trace metal analysis. Use only a
laboratory that has experience with these types of
samples and that can test reliably in the sub-ppb range.
The number of elements and concentrations that are to
be analyzed will vary depending on customers’
requirements.
6.3.1.3 Evaluate data and compare to the agreed-upon
specification. A typical specification is <X ppb total
and <X ppb per element.
6.3.1.4 If the trace metal specification is not met, drain
or flush the entire BCDS and distribution piping and
repeat the process.
6.3.1.5 If a maximum level of impurities is desired, a
sample of the UPW used to charge the system should be
tested to establish a baseline and to ensure that the
incoming UPW is not the source of high impurities.
6.3.1.6 Once the BCDS has been qualified for particles
and trace metals in UPW, the qualification of the BCDS
in Chemical may be initiated.
7 Chemical Conditioning of The System
7.1 Advantages of Conditioning the System
Another precleaning step that may be used
independently or in conjunction with a UPW flush is to
condition the BCDS by actively flushing it with an
aggressive chemical that extracts impurities from the
internal surfaces of the system. This step is sometimes
referred to as "pickling" the system. This extra step can
help minimize the amount of time consumed in the
qualification process by utilizing a chemical with more
aggressive extraction properties than the actual
chemical to be used in the line, thereby increasing the
rate at which impurities are removed. This can shorten
the amount of time needed until the actual chemical can
be put into the line and shown to meet the qualification
specifications. Since a goal of a well-designed
qualification protocol is to minimize the amount of high