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SEMI P10-0705 © SEMI 1990, 2005 153 CD_DEVIATI ON_FROM_TARGET — Maximum acceptable deviation of any of the cust omer-required CD measurem ents from the CD_TARGET. If only one data value (p) appears in the data f ield, th…

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SEMI P10-0705 © SEMI 1990, 2005 152
RELATED INFORMATION 1
CRITICAL DIMENSION KEYWORDS
NOTICE: This related information is not an official part of SEMI P10 and was derived from the North American
Microlithography Committee. This related information was approved for publication by full letter ballot on
April 22, 2004.
CD_TOLERANCE — Maximum acceptable deviation of the mean of all measured critical
dimensions to the CD_TARGET
CD_RANGE — Maximum acceptable variation of all measured critical dimensions of same
nominal size, same tone and same orientation, relative to each other.
CD_DEVIATION_FROM_MEAN — Maximum acceptable deviation of any of the customer-
required CD measurements from the mean of those measurements.
Mean Target
SEMI P10-0705 © SEMI 1990, 2005 153
CD_DEVIATION_FROM_TARGET — Maximum acceptable deviation of any of
the customer-required CD measurements from the CD_TARGET.
If only one data value (p) appears in the data field, the tolerance is considered +/-
symmetrically about CD_TARGET.
If two data values ( p [,m] ) appear, then the first is the maximum amount by
which deviation is allowed larger than CD_TARGET, and the second is the
maximum amount by which deviation is allowed smaller than CD_TARGET. The
comma and second half of the argument are optional in the syntax (p[,m]) where
p = the plus and m = the minus value for non-symmetric tolerances; if only p is
specified, the plus and minus values are assumed to be symmetric.
p
p
p
m
CD_THREE_SIGMA — Maximum acceptable 3-sigma deviation of all measured
critical dimensions to the the mean of all measured critical dimensions
CD_XY_DEVIATION — Maximum deviation, on a site-by-site basis, of a
horizontal critical dimension to a vertical critical dimension. The two critical
dimensions at each site must be the same size in the pattern data and the
same tone on the mask.
CD_XY_TOLERANCE — Maximum acceptable deviation of the mean of all
measured horizontal critical dimensions to the mean of all measured vertical
mask critical dimensions. Critical dimensions at all sites must be the same size in
the pattern data.
Distribution of
X
vs Y
Horizontal Vertical
SEMI P10-0705 © SEMI 1990, 2005 154
RELATED INFORMATION 2
SEMI PHOTOMASK ORDER DATA FILE EXAMPLE
NOTICE: The information contained in this related information is not an official part of SEMI P10, and it is not
intended to modify or supercede the official standard. Rather, this example is offered as an aid to visualizing
possible output from software which might implement the standard.
EXAMPLE: A pair of 4-die 5 reticles with separate scribe, barcode, and rms alignment marks. Critical dimensions
are defined as pattern options.
barcode
rms
mark
mask title 1
mask title 2
rms
mark