semi合集-English.pdf - 第5525页

SEMI P10-0705 © SEMI 1990, 2005 20 {< defect_measurem ents >} END_PATTERN_GROUP_RESULTS <phase_shift_measurements> = START_PHASE_SHIFT_MEASUREMENTS PSM_WAVELENGTH [ PHASE_SHIFT_QUALITY_ID ] [ START_TRANSMISSI…

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SEMI P10-0705 © SEMI 1990, 2005 19
EUV_MMR_WAVELENGTH
EUV_MEAN_PEAK_REFLECTIVITY
EUV_PEAK_REFLECTIVITY_UNIFORMITY
EUV_ABSORBER_COMPOSITION
EUV_ABSORBER_OPTICAL_PROPERTIES
EUV_BLANK_RESISTANCE
EUV_EXPANSION_COEFF
END_EUV_BLANK_TYPE
<wafer_exposure_data> = START_WAFER_EXPOSURE_DATA
WAFER_EXPOSURE_NUMERICAL_APERATURE
[WAFER_EXPOSURE_SIGMA]
[WAFER_EXPOSURE_SIGMA_INNER WAFER_EXPOSURE_SIGMA_OUTER]
WAFER_EXPOSURE_ILLUMINATION
END_WAFER_EXPOSURE_DATA
<aerial_image_data> = START_AERIAL_IMAGE_DATA
AIM_WAVELENGTH
[AIM_INTENSITY_VARIATION_DELTA]
[AIM_FLUX_INTENSITY_DELTA]
[AIM_CD_DELTA]
END_AERIAL_IMAGE_DATA
<litho_information> = START_LITHO_INFORMATION
{ [LITHO_EQUIP_REQD] {EQUIP_SITE_REQD}
{ [
LITHO_MODEL_REQD] {LITHO_MODE_REQD} } }
[LITHO_EQUIP_USED] [EQUIP_SITE_USED]
[LITHO_MODEL_USED] [LITHO_MODE_USED]
[MACHINE_SERIAL_NUMBER]
[MASK_SERIAL_NUMBER]
[PROCESS]
[WRITE_DATE_TIME] [ELAPSED_WRITE_TIME]
[OPERATOR]
END_LITHO_INFORMATION
<pattern_group_results> = START_PATTERN_GROUP_RESULTS
PATTERN_GROUP_ID
{<
phase_shift_measurements>}
{<
registr_measurements>}
{<
closure_measurements>}
{<
cd_group_measurements>}
{<
cd_set_results>}
{<
cd_xy_results>}
{<cd_iso_dense_results>}
SEMI P10-0705 © SEMI 1990, 2005 20
{<defect_measurements>}
END_PATTERN_GROUP_RESULTS
<phase_shift_measurements> =
START_PHASE_SHIFT_MEASUREMENTS
PSM_WAVELENGTH
[
PHASE_SHIFT_QUALITY_ID]
[
START_TRANSMISSION_MEASUREMENTS
[
TRANSMISSION_MEASUREMENT_DATE]
[
TRANSMISSION_EQUIP_USED]
[
TRANSMISSION_MODE_USED]
[
TRANSMISSION_MEASUREMENT_FILE_NAME]
TRANSMISSION_TARGET
[TRANSMISSION_REFERENCE_ONLY]
[
TRANSMISSION_TOLERANCE]
[
TRANSMISSION_RANGE]
[
TRANSMISSION_ERROR]
[
MEASURED_TRANSMISSION_AVERAGE]
[
MEASURED_TRANSMISSION_TOLERANCE]
[
MEASURED_TRANSMISSION_RANGE]
[
TRANSMISSION_MARK_FEATURE]
[
TRANSMISSION_MARK_LOCATION_DRAWING]
[
TRANSMISSION_MARK_DRAWING]
{
MEASURED_TRANSMISSION_MARK_SITE_ID
[ TRANSMISSION_MARK_LOCATION ]
MEASURED_TRANSMISSION_MARK_LOCATION
MEASURED_TRANSMISSION
[
MEASURED_TRANSMISSION_ERROR]
END_MEASURED_TRANSMISSION_SITE }
END_TRANSMISSION_MEASUREMENTS ]
[
START_PHASE_ANGLE_MEASUREMENTS
[
PHASE_ANGLE_MEASUREMENT_DATE]
[
PHASE_ANGLE_EQUIP_USED]
[
PHASE_ANGLE_MODE_USED]
[
PHASE_ANGLE_MEASUREMENT_FILE_NAME]
PHASE_ANGLE_TARGET
[PHASE_ANGLE_REFERENCE_ONLY]
[
PHASE_ANGLE_TOLERANCE]
[
PHASE_ANGLE_RANGE]
[
PHASE_ANGLE_ERROR]
[
MEASURED_PHASE_ANGLE_AVERAGE]
[MEASURED_PHASE_ANGLE_TOLERANCE]
SEMI P10-0705 © SEMI 1990, 2005 21
[MEASURED_PHASE_ANGLE_RANGE]
[
PHASE_ANGLE_MARK_FEATURE]
[
PHASE_ANGLE_MARK_LOCATION_DRAWING]
[
PHASE_ANGLE_MARK_DRAWING]
{
MEASURED_PHASE_ANGLE_MARK_SITE_ID
[
PHASE_ANGLE_MARK_LOCATION ]
MEASURED_PHASE_ANGLE_MARK_LOCATION
MEASURED_PHASE_ANGLE
[
MEASURED_PHASE_ANGLE_ERROR]
END_MEASURED_PHASE_ANGLE_SITE }
END_PHASE_ANGLE_MEASUREMENTS ]
[
START_ETCH_DEPTH_MEASUREMENTS
[
ETCH_DEPTH_MEASUREMENT_DATE]
[
ETCH_DEPTH_EQUIP_USED]
[
ETCH_DEPTH_MODE_USED]
[
ETCH_DEPTH_MEASUREMENT_FILE_NAME]
ETCH_DEPTH_TARGET
[ETCH_DEPTH_REFERENCE_ONLY]
[
ETCH_DEPTH_TOLERANCE]
[
ETCH_DEPTH_RANGE]
[
ETCH_DEPTH_ERROR]
[
MEASURED_ETCH_DEPTH_AVERAGE]
[
MEASURED_ETCH_DEPTH_TOLERANCE]
[
MEASURED_ETCH_DEPTH_RANGE]
[
ETCH_DEPTH_MARK_FEATURE]
[
ETCH_DEPTH_MARK_LOCATION_DRAWING]
[
ETCH_DEPTH_MARK_DRAWING]
{
MEASURED_ETCH_DEPTH_MARK_SITE_ID
[
ETCH_DEPTH_MARK_LOCATION ]
MEASURED_ETCH_DEPTH_MARK_LOCATION
MEASURED_ETCH_DEPTH
[
MEASURED_ETCH_DEPTH_ERROR]
END_MEASURED_ETCH_DEPTH_SITE
}
END_ETCH_DEPTH_MEASUREMENTS ]
[OPERATOR]
END_PHASE_SHIFT_MEASUREMENTS
<registr_measurements> = START_REGISTR_MEASUREMENTS
[REGISTR_QUALITY_ID]
{REGISTR_EQUIP_REQD} {EQUIP_SITE_REQD} {REGISTR_REF_METHOD_REQD}
[REGISTR_STD_GRID] [REGISTR_ALGORITHM]