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SEMI E112-0305 © SEMI 2001, 2005 15 APPENDIX 1 APPLICATION NOTES NOTICE : This appe ndix is an official part of SEM I E112 and was approved by full letter ballot proced ures on August 27, 2001, but the reco mmendations i…

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SEMI E112-0305 © SEMI 2001, 2005 14
Symbol Used Figure Value Specified Reference Measured From Feature Measured To
z295 4 108.20 mm
(4.260 in.)
horizontal reference plane nominal reticle seating plane
z296 4 127.25 mm
(5.010 in.)
horizontal reference plane nominal reticle seating plane
z297 6 1.5 mm (0.059 in.)
minimum
each nominal reticle seating
plane
edge of end-effector exclusion
volume
z298 6 9.4 mm (0.370 in.)
minimum
each nominal reticle seating
plane
edge of lift clearance exclusion
volume
z299 6 8.95 mm (0.352 in.)
minimum
each nominal reticle seating
plane
edge of end-effector exclusion
volume
z300 6 8 mm (0.315 in.)
minimum
each nominal reticle seating
plane
edge of end-effector exclusion
volume
z301 4 22 mm (0.866 in.)
maximum
horizontal reference plane edge of safety rail exclusion volume
z302 4 23.5 ± 0.5 mm
(0.925 ± 0.020 in.)
horizontal reference plane edge of first reticle end-effector
exclusion volume
z308 11 25 mm (0.984 in.)
maximum
horizontal reference plane edge of RFID
placement zone
z310 3, 5 8 mm (0.315 in.)
maximum
bottom surface of robotic
handling flange
top of robotic handling flange
z311 4 12.7 mm (0.500 in.)
maximum
nominal reticle seating plane edge of lift clearance exclusion
volume
z314 n/a 133 mm (5.236 in.)
minimum
horizontal reference plane top of reticle backstops
z315 11 30 mm (1.181 in.)
maximum
horizontal reference plane top of RFID
placement zone
z316 11 10 mm (0.394 in.)
minimum
horizontal reference plane bottom of RFID
placement zone
SEMI E112-0305 © SEMI 2001, 2005 15
APPENDIX 1
APPLICATION NOTES
NOTICE: This appendix is an official part of SEMI E112 and was approved by full letter ballot procedures on
August 27, 2001, but the recommendations in this appendix are optional and are not required to conform to this
standard.
A1-1 Edge contact only with the photomask is preferred when handling, transporting or storing.
A1-2 Skewness, warp, rock, and stiffness are implicitly defined in the dimensional tolerances.
A1-3 Features on the MRSP150 which enable stacking may be required by end users. It is preferred that these
features allow stacking in only one orientation.
A1-4 Features on the MRSP150 which provide visual orientation of the MRSP150 top and MRSP150 door may be
required by end users.
SEMI E112-0305 © SEMI 2001, 2005 16
RELATED INFORMATION 1
NOTICE: This related information is not an official part of SEMI E112, and it is not intended to modify or
supercede the official standard. This information was inserted by the North America Physical Interfaces and
Carriers Committee to alert the readers to potential changes to this provisional standard.
R1-1 In the event end-effector and pellicle exclusion volumes can be developed which would satisfy all
lithography equipment manufacturers and allow for a 126 mm pellicle, then the appropriate changes would be
balloted to update the standard.
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer's instructions, product labels, product data sheets, and other relevant
literature, respecting any materials or equipment mentioned herein. These standards are subject to change without
notice.
By publications of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any items mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of
the contents in whole or in part is forbidden without express written
consent of SEMI.