semi合集-English.pdf - 第1486页

SEMI E30.5-0302 © SEMI 2001, 2002 14 Variab le name Category Descrip tion Class Format Commen ts SlotID CV The cass ette slot number. DVVAL U4 WaferID CSV Physica l wafer identifier. SV A[1 . .2 4] WaferIDRead CSV Tool r…

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SEMI E30.5-0302 © SEMI 2001, 200213
Variable name Category Description Class Format Comments
M21Data CSV The data necessary to establish an
MSEM SEMI M21 layout on a
silicon wafer.
DVVAL
L,2
1. L,3
1.<M21XSize>
2.<M21YSize>
3. <Tile>
2. L,n
1. L,3
1.<ElementID>
2.<CoordX>
3.<CoordY>
:
n
Coord x and
Coord y are the X
and Y coordinates
in the M20P
coordinate system
of the lower left-
hand corner of the
element. See
Table 5 for
additional
information.
QueuedJobList CSV An ordered list of CarrierID data
items (A[1..16]) of material that
is queued to run. The first item in
the list is the ID of next carrier to
run. A soon as a job specified by
a PROCESS-BLD-GROUP
starts, the CarrierID it specifies is
removed from the head of the list.
SV
L
Offset CSV The difference between the
defined location of a site and the
location at which it is found.
DVVAL
F4[2]
SiteDeltaX,
SiteDeltaY
Operator Action CV Action taken by operator on
equipment’s front panel.
DVVAL
A[1..80]
OperName CV Tool Operator name ECV
A[1..16]
Orientation CV The direction, in degrees, from
the equipment's “0” location for a
wafer's primary fiducial when
initially positioned for
measurements.
ECV
F4
This parameter
has no effect on
the “M20” based
wafer coordinate
system as
discussed in
SEMI standard
SEMI M20.
PP-Name CV The PPID that is being used for
measuring.
SV
A[1..80]
Process SlotList CV The list of cassette slots whose
contents are to be processed.
DVVAL
L,n
1. <SlotID>
.
.
.
L,0 indicates all
slots are to be
processed. See
Table 5 for
additional
information.
SiteDeltaX CSV The x axis translation between
the defined and found locations
of a site, in µm.
DVVAL
F4
Units are in
microns.
SiteDeltaY CSV The y axis translation between
the defined and found locations
of a site, in µm.
DVVAL
F4
Units are in
microns
SiteList CV The list of sites where
measurements are made.
DVVAL
L,n
1.<SiteName>
.
.
n
See Table 5 for
additional
information.
SiteName CV A unique identifier for a site. DVVAL
A[1..16]
SEMI E30.5-0302 © SEMI 2001, 2002 14
Variable name Category Description Class Format Comments
SlotID CV The cassette slot number. DVVAL
U4
WaferID CSV Physical wafer identifier. SV
A[1..24]
WaferIDRead CSV Tool read wafer identifier. SV
A[1..24]
WaferSize CV The nominal diameter of a silicon
wafer.
EC
A[1..16]
mm
XlateData CSV Variable for the equipment to
report the pattern-based
coordinate system offset from the
wafer-based coordinate system
found on the wafer being tested.
SV
L,4
1 <DeltaX>
2 <DeltaY>
3 <Theta>
4 <ScaleFactor>
See Appendix 1
for an example.
See Table 5 for
additional
information.
9.6.5 Data Item Sub-variable List
Table 5 Data Item Sub-Variable List
Data Item Sub-
variables
Description Format Comment
AlignName The identifier given to a alignment site. A[1..16]
CoordX The x coordinate for a site. F4 Units are in microns.
CoordY The y coordinate for a site. F4 Units are in microns.
DeltaX The x axis translation between the origins of two
coordinate systems, in µm.
F4 Units are in microns.
DeltaY The y axis translation between the origins of two
coordinate systems, in µm.
F4 Units are in microns.
ElementID The M21 address for a specific rectangular element
on a patterned silicon wafer.
I4[2] M21 row number, M21 column
number
Fiducial The type of primary fiducial on a silicon wafer. A[1..16] Options are “FLAT” or
“NOTCH”
M21XSize
The M21 element size in the x direction, in µm.
F4 Units are in microns.
M21YSize
The M21 element size in the y direction, in µm.
F4 Units are in microns.
ScaleFactor The scaling factor required by the equipment to
adjust from its SEMI M20 coordinate system to the
coordinate system established through the use of
pattern alignment “alignment site” information. In
most cases, a scaling factor of 1 is expected.
F4
SiteDeltaX The x axis translation between the defined and
found locations of a site, in µm.
F4 Units are in microns.
SiteDeltaY The y axis translation between the defined and
found locations of a site, in µm.
F4 Units are in microns.
SiteName A unique identifier for a site. A[1..16]
THETA (Θ)
The clockwise rotation, in radians, between the
SEMI M20 and M20P coordinate system axes.
F4 Radians
Tile A flag to indicate whether the SEMI M21 layout is
tiled, and in which direction.
A[1..16] Options are:
“NTILE” is untitled “CTILE”
is column tiled “RTILE” is
row tiled
SEMI E30.5-0302 © SEMI 2001, 200215
10 Alarm List
10.1 Since each model of equipment differs in
configuration, it is not practical to provide an
exhaustive list of all possible alarms. Instead, the
MSEM is requiring the two tables provided as
described in SEMI E30 (Document Section). Alarm
List Table which is intended to provide for equipment
configuration specific alarms and Alarm ID, Alarm
Set/Cleared Event Table.
10.2 Alarm List Table
10.2.1 The alarm list table contains examples of alarms
that pertain to various configurational aspects of
equipment. These examples are intended to illustrate
that alarms pertain to situations in which there exists a
potential for exceeding physical safety limits associated
with people, equipment, and material being processed
as per the SEMI E30 definition of an alarm. See SEMI
E30 for further reference.
10.3 Alarm ID, Alarm Set/Cleared Event Table
10.3.1 The Alarm ID, Alarm Set/Cleared Event table
documents the association of each ALID to a set and
cleared event as required by SEMI E30. See SEMI E30
for further reference.
11 Process Program Management
11.1 Requirements
The MSEM requires that the
SEMI E30 capability of Process Program Management
be fully supported for this class of equipment. The
MSEM is also requiring that the Process Program have
a structure that enables the user to build Process
Programs with default conditions that can be overridden
for a run. MSEM is requiring the ability to vary; the
quantity of substrates measured, the alignment
information used and the number and/or location of the
sites to be measured through the uses of Process
Program variable parameters. The concepts of Process
Program Structure and Process Program variable
parameters are discussed in the following sections.
11.2 Process Program Structure
11.2.1 Definition and Rules for Process Programs
A Process Program contains information and/or
instructions required for the metrology equipment to
process a given run of material. Equipment constants
can be used to supplement the information contained in
a Process Program.
11.2.1.1 The Process Program shall supply all of the
information required for a remotely executed run to be
processed without operator intervention. Any
information that is normally requested from the
operator console in manual operation shall have default
values assigned in the body of the Process Program.
11.2.1.2 Process-program parameters are used to tailor
a specific run of material and do not permanently
modify the Process Program. They will remain in
effect only until the next run or until the next PP-
UPDATE or PP-SELECT, PP-ASSIGN remote
command.
11.2.1.3 MSEM is requiring the ability to define
specific Process Program variable parameters to; define
what substrates are to be measured (Process SlotList),
what sites are to be measured (SiteList or M21SiteList)
and what aligns are used by the Process Program
(AlignList or M21AlignList). If the MSEM equipment
is using the SEMI M21 coordinate system then an
additional Process Program variable parameter is
required what elements are to be measured
(ElementList).
11.2.2 Definition of Process Program Variable
Parameters
A process-program parameter specifies
a value that temporarily modifies the value of a variable
parameter in a Process Program. A variable parameter
is formally defined within a process-program body and
contains:
• a variable parameter name that is unique in the
body
• a parameter initial value, known as default value,
for use when the Process Program is selected for
execution without specification of an override
value for this variable parameter.
11.2.3 The Equipment may also support the definition
including:
• a parameter restriction that represents one or more
conditions that any value specified for the
parameter must satisfy.
• a CP-NAME in a remote command must be
identical to a variable parameter name in the
Process Program specified in the remote command.
If the Equipment allows Sub-process Programs, a
Sub-process Program reference may also specify
parameters.
11.2.4 Relationship of Process Program Variable
Parameter
The PP-SELECT, PP-ASSIGN or PP-
UPDATE remote commands can be used to modify
variables within the Process Program. The
modification to process-program variables is done by
using CP-NAME/CP-VAL pairs within the command.