semi合集-English.pdf - 第5634页
SEMI P10-0705 © SEMI 1990, 2005 129 8.1.351 LI THO_MODEL_REQD — (ALTA_30 00, ALTA_3500, ALTA_370 0, ALTA_4300, CORE_2000, CORE_2100, CO RE_2500, CORE_2564 , EBM_3500, EBM_4000, HL_800 , HL_900, HL_950, HL_700 0, JBX_3030…
SEMI P10-0705 © SEMI 1990, 2005 128
8.1.331 INSPECT_ALL_SITES — If T, all placements of patterns under this <cell_instance> or
<pattern_instance> require in-spection, regardless of the number of inspection tool setups necessary to do so.
8.1.332 INSPECT_THROUGH_PELLICLE — (T or F) If T, the mask must be inspected through the pellicle and
the <defect_definition> and <database_inspection> keywords to be used must follow the
INSPECT_THROUGH_PELLICLE keyword. Unpelliclized inspection may be separately defined and would
precede the INSPECT_THROUGH_PELLICLE keyword.
8.1.333 INSPECTION_AREA — (x1,y1,x2,y2) Unscaled coordinates of window for defect inspection, lower left
and upper right corners, relative to the nominal center of mask, pattern or cell (chrome side up for masks,
unmirrored for patterns or cells).
8.1.334 INSPECTION_AREA_EXCLUDE — (x1, y1, x2, y2) Unscaled coordinates of window to be excluded
from defect inspection. This is commonly referred to as DNIR (Do Not Inspect Region). (See
INSPECTION_AREA.)
8.1.335 INSPECTION_REF_LOCATION — (x,y) Location of reference mark for defect inspection, relative to the
nominal center of the substrate (chrome side up).
8.1.336 INSPECTION_SETUP_FILENAME — Alphanumeric name of setup file for defect inspection equipment.
8.1.337 JOB_ONLY_APPROVAL_REQD — (T or F) Explicit approval of the mask writing control file must be
given by the customer before the mask is to be written or further processed.
8.1.338 JOB_ONLY_APPROVED — Date approval was granted by customer for
JOB_ONLY_APPROVAL_REQD.
8.1.339 JOB_WITH_PATTERNS_APPROVAL_REQD — (T or F) Explicit approval of the mask writing control
file and all referenced pattern files must be given by the customer before the mask is to be written or further
processed.
8.1.340 JOB_WITH_PATTERNS_APPROVED — Date approval was granted by customer for
JOB_WITH_PATTERNS_APPROVAL_REQD.
8.1.341 JOB_FORMAT — (MEBES, EEBES, ATEQ, and others on request) Format of preceding JOB NAME.
8.1.342 JOB_LEVEL — Level of preceding JOB_NAME to be used to make mask.
8.1.343 JOB_NAME — Name of job file to be used to make mask(s).
8.1.344 LAYER_PRIORITY — Sequence number in which masks are needed. Together with ELAPSED_TIME
determines the mask delivery schedule. The first mask (LAYER_PRIORITY=1) is due within its ELAPSED_TIME
from the time it is ordered or released; the second mask is due within its ELAPSED_TIME from when the first mask
was due, or from when the first mask was delivered, whichever is later; and so on.
8.1.345 LEVEL_ID — Numerical indicator of which masks within the mask set will include this pattern. When a
MASK_ID in a MASK_GROUP, which references this PATTERN_GROUP_ID, matches this LEVEL_ID, this
pattern will appear on the mask. When LEVEL_ID is “A”, the pattern will appear on all masks which reference the
pattern group. A given LEVEL_ID value may appear only once in any pattern group. Appearance of “A” as a
LEVEL_ID value precludes any other patterns from the pattern group.
8.1.346 LINE_ITEM_NUMBER — Integer line item number relative to PO_NUMBER.
8.1.347 LITHO_EQUIP_REQD — (EBEAM, OPTICAL, LASER) Acceptable equipment for writing product
mask(s).
8.1.348 LITHO_EQUIP_USED — Type of equipment used for writing product mask(s). See
LITHO_EQUIP_REQD.
8.1.349 LITHO_MODE_REQD — (SPP,MPP,VA,4PASS,8PASS,1000UM, and others on request.) Acceptable
recipe for LITHO_EQUIP_REQD.
8.1.350
LITHO_MODE_USED — The writing methodology used by the lithography tool.
SEMI P10-0705 © SEMI 1990, 2005 129
8.1.351 LITHO_MODEL_REQD — (ALTA_3000, ALTA_3500, ALTA_3700, ALTA_4300, CORE_2000,
CORE_2100, CORE_2500, CORE_2564, EBM_3500, EBM_4000, HL_800, HL_900, HL_950, HL_7000,
JBX_3030, JBX_7000, JBX_9000, LRS_55, LRS_800, MANN_3000, MANN_3600, MANN_3696, MEBES III,
MEBES IV, MEBES_4000, MEBES_4500, MEBES_4700, MEBES_5000, MEBES_5500, MEBES_EXARA,
MM_101, MP_508, OMEGA_6600, SIGMA_7100, SIGMA_7300, TAMARACK_142, TAMARACK_155,
TOSHIBA_4700, TRE_220, ULTRABEAM_V2000, ZBA_21, ZBA_23H, ZBA_31, ZBA_31H+, ZBA_320,
ZBA_340, and others on request) Model of acceptable mask writing equipment.
8.1.352 LITHO_MODEL_USED — The model name of the lithography tool used to perform the lithography
operation. See LITHO_MODEL_REQD.
8.1.353 LOCATION — (x,y) Location of the center of the initial pattern or cell, relative to center of the preceding
CELL_ID (before mirroring or scaling).
8.1.354 LOCATION_SPEC — Alphanumeric identification of customer-supplied specification for pattern or cell
placement.
8.1.355 LOG_FILE_NAME— (text) Name identifying the log output file for RUNSET_NAME. If this keyword
appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.356 MACHINE_SERIAL_NUMBER — (text) The serial number of the lithography tool used to perform the
lithography operation.
8.1.357 MAILING_ADDRESS — Postal address.
8.1.358 MASK_COATING — (HIGH_REFLECTIVE_CHROME, MEDIUM_REFLECTIVE_CHROME,
LOW_REFLECTIVE_CHROME, SEE_THROUGH_CHROME, IRON_OXIDE, CHROME_OXIDE,
EMULSION) or in the case of other coatings, an alphanumeric description. (See SEMI P2.)
8.1.359 MASK_GROUP_ID — Name of the mask group which follows; must be used in all references within this
MASK_SET_ID to this mask group.
8.1.360 MASK_ID — Unique integer identifier of each mask within mask set. All patterns referenced by the
MASK_GROUP_ID’s PLACEMENT_TOP_CELL whose LEVEL_ID’s match this MASK_ID will appear on the
mask. When LEVEL_ID is “A”, the pattern will appear on all masks whose PLACEMENT_-TOP_CELL
references the pattern group.
8.1.361 MASK_NAME — Name used by customer for mask, to be used to cross-reference MASK_ID to
customer’s internal tracking system. This is primarily for the customer’s use only, but should be recorded by the
vendor and reported back in <mask_results>.
8.1.362 MASK_REGISTR_MARK — (x,y) Location of registration reference mark in <mask_order>, relative to
the nominal center of substrate (chrome side up).
8.1.363 MASK_REGISTR_MARK_LOCATION — (x,y) Location of individual registration mark, relative to
nominal center of substrate (chrome side up), based on <mask_order> information. This is the target location for the
mark, reflected in <mask_results>.
8.1.364 MASK_ROTATION — (0, 90, 180 and 270) Degrees to rotate the entire set of mask data (patterns, titles,
barcodes, etc.) counterclockwise (assuming a chrome-up orientation).
8.1.365 MASK_SERIAL_NUMBER — (alphanumeric) The serial number title written on the mask during
lithography - usually numeric, but alphanumeric if agreed by customer and vendor.
8.1.366 MASK_SET_ID — The “name” of the mask set, often the device name or number. This must be used in all
future references to this mask set and must be unique among mask sets ordered by the customer.
8.1.367 MASK_SET_NAME — Name used by customer for mask set, to be used to cross-reference
MASK_SET_ID to customer’s internal tracking system. This is primarily for the customer’s use only, but should be
recorded by the vendor and reported back in <mask_results>.
SEMI P10-0705 © SEMI 1990, 2005 130
8.1.368 MASK_SET_VERSION — Name used by customer for versions of the mask set, to be used to cross-
reference MASK_SET_ID to customer’s internal tracking system. This is primarily for the customer’s use only, but
should be recorded by the vendor and reported back in <mask_results>.
8.1.369 MASK_SHIPPED_DATE_TIME – (date) The date and time the mask left the mask shop for delivery to the
customer.
8.1.370 MAX_MASKS_IN_PACKAGE — Integer maximum number of masks to be shipped inside PACKAGE.
8.1.371 MEASURE_FILE_FORMAT — (MF2, MF3, MTX, IMP, and others on request.)
8.1.372 MEASURE_FILE_NAME — Alphanumeric name of file to be used for registration mark locations. When
MEASURE_FILE_NAME follows MASK_REGISTR_MARK or CELL_REGISTR_MARK, the mark locates the
origin of the measure file. When in <mask_options> or in <pattern_options>, MEASURE_FILE_NAME must
follow either MASK_REGISTR_MARK or CELL_REGISTR_MARK.
8.1.373 MEASURED_CD — The critical dimension measurement at the CD_LOCATION, as measured by the
vendor.
8.1.374 MEASURED_CD_DENSE_MEAN — Average of all measured dense CD features.
8.1.375 MEASURED_CD_DENSE_RANGE — CD_RANGE of the dense features on the mask as measured by
the vendor.
8.1.376 MEASURED_CD_DEVIATION_FROM_MEAN — (n, m) For all measurements in the associated
<measured_cd_results> section, the difference (n) between the maximum measurement and the mean, and the
difference (m) between the mean and the minimum measurement. “n” will always be positive; “m” will always be
negative.
8.1.377 MEASURED_CD_DEVIATION_FROM_TARGET — (numeric) CD_DEVIATION_FROM_TARGET of
the mask as measured by the vendor. This is the largest single deviation of all measurement points from the
specified target. If the largest deviation is for a CD larger than the target, then the value will be positive; if the
largest deviation is for a CD smaller than the target, then the value will be negative.
8.1.378 MEASURED_CD_FILE_NAME — Name of data file containing results of CD measurement.
8.1.379 MEASURED_CD_ISO_DENSE_TOLERANCE — CD_ISO_DENSE_TOLERANCE of the mask as
measured by the vendor. The mean of the ISOLATED critical dimensions should always be subtracted from the
mean of the DENSE critical dimensions.
8.1.380 MEASURED_CD_ISO_MEAN — Average of all measured isolated CD features.
8.1.381 MEASURED_CD_ISO_RANGE — CD_RANGE of the isolated features on the mask as measured by the
vendor.
8.1.382 MEASURED_CD_LOCATION — (x,y) The actual location, relative to the nominal center of the
mask, of
the critical dimension as measured by the vendor.
8.1.383 MEASURED_CD_MAX — (number) For the associated <cd_group> or <cd_set>, the maximum of all
measurements.
8.1.384 MEASURED_CD_MEAN — (number) For the associated <cd_group> or <cd_set>, the mean of all
measurements.
8.1.385 MEASURED_CD_MIN — (number) For the associated <cd_group> or <cd_set>, the minimum of all
measurements.
8.1.386 MEASURED_CD_RANGE — (number) CD_RANGE of the mask as measured by the vendor.
For the
associated <cd_group> or <cd_set>, this is the difference between the maximum measurement and the minimum
measurement.
8.1.387 MEASURED_CD_SITE_ID — Must match CD_SITE_ID in <mask_order> for site being measured. If the
customer assigned no CD_SITE_ID for the required location (e.g., only CD_LOCATION_DRAWING was used),
the vendor will assign a MEASURED_CD_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID. If CD_SITE_ID
was used as a <pattern_options> in <mask_order> for a pattern with multiple