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SEMI C43-0699 © SEM I 1999 3 15 Tier B P rocedures 15.1 This section does not apply to t h i s chemical. 16 Tier C P rocedures 16.1 This section does not apply to t h i s chemical. 17 Tier D P rocedures 17.1 This section…

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SEMI C43-0699 © SEMI 1999 SODIUM HYDROXIDE, 50% SOLUTION2
hydrochloric acid. For the standard, take 50 mL of
water in a similar flask, and add 10 mL of the stock
solution and 1 mL of the nitrogen standard solution
(0.010mg N/ml). To each flask add 0.5 g of aluminum
wire in small pieces, and allow the solution to stand for
1 hour. Slowly distill to about 35 mL of solution. To
each distillate add 2 mL of freshly boiled 10% sodium
hydroxide reagent solution, dilute with water to 50 mL
and add 2 mL of Nessler reagent. Any color in the
solution of the sample should not exceed that in the
standard.
8.7 Chloride Dilute l0 mL of th e stock solution
with water to 100 mL. Filter, if necessary, through a
chloride-free filter. To 25 mL of this solution, add 5
mL of water, 1 mL of nitric acid, and 1 mL of silver
nitrate reagent solution. Any turbidity developed
should not exceed that produced by 0.01 mg of chloride
(CI) ion in an equal volume of solution containing the
quantities of reagent used in the test
8.8 Phosphate To 40 mL of the stock solution, add
10 mL of hydrochloric acid and evaporate to dryness on
a steam bath. Dissolve the residue in 25 mL of 0.5 N
sulfuric acid. Add 1 mL of ammonium molybdate
reagent solution and l mL of p-(methylamino)phenol
sulfate reagent solution. Allow the solution to stand for
2 hours at room temperature. Any blue color developed
should not exceed that produced when 0.02 mg of
phosphate (PO
4
) ion is treated as the sample.
8.9 Sulfate To 40 mL of the stock solution, add 5
mL of hydrochloric acid and evaporate to dryness on a
steam bath. Dissolve the residue in 20 mL of water and
evaporate again to dryness. Dissolve the residue in 20
mL of water, filter if necessary, and add 1 mL of dilute
hydrochloric acid (1+19) and 1 mL of barium chloride
reagent solution. Allow the solution to stand for 10
minutes. Any turbidity developed should not exceed
that produced when 0.04 mg of sulfate (SO
4
) ion is
treated as the sample.
8.10 Heavy Metals (as Ag) To 60 mL of the stock
solution cautiously add 20 mL of nitric acid. For the
standard add 0.05 mg of silver ion (Ag) to 10 mL of the
stock solution and cautiously add 20 mL of nitric acid.
Evaporate both solutions to dryness over a low flame or
on an electric hot plate. Dissolve each residue in about
20 mL of water, filter if necessary through a chloride-
free filter, and dilute with water to 25 mL. Adjust the
pH of the standard and sample solutions to between 3
and 4 (using a pH meter) with 1 N acetic acid or
ammonium hydroxide (10% NH
3
). Dilute each solution
with water to 40 mL and stir. Add 10 mL of freshly
prepared hydrogen sulfide water to each solution and
stir again. Any color developed in the sample should
not exceed that in the standard.
8.11 Iron Neutralize 20 mL of the stock solution
with hydrochloric acid, using a phenolphthalein
indicator solution, add 2 mL of HCI in excess, and
dilute with water to 50 mL. Add 30 to 50 mg of
ammonium peroxydisulfate crystals and 3 mL of
ammonium thiocyanate reagent solution. Any red color
developed should not exceed that produced when 0.01
mg of iron (Fe) ion is treated as the sample.
8.12 Nickel Dilute 40 mL of the stock solution to
50 mL with water and neutralize with hydrochloric acid
using a pH meter. Dilute to 85 mL with water and add
ammonium hydroxide to make the solution barely basic
(pH 8). Add 5 mL of bromine water and 5 mL of
alcoholic 1% dimethylgy1oxime solution in alcohol,
and 5 mL of 10% sodium hydroxide reagent solution.
Any red color developed should not exceed that
produced when 0.02 mg of nickel (Ni) ion is treated as
the sample.
8.13 Potassium Dilute 10 mL of the stock solution
with water to 100 mL to form the sample solution. To
prepare the standard solution, add 0.1 mg of potassium
(K) ion to 10 mL of the stock solution and dilute with
water to 100 mL.
8.13.1 Using flame emission spectroscopy, observe
the emission of the standard solution at the 767 nm
potassium line. Observe the emission of the sample
solution at the 767 nm potassium line and also at a
wavelength of 750 nm. The difference between the
intensities observed for the Sample Solution at 767 nm
and 750 nm should not exceed the difference observed
at 767 nm between the sample solution and standard
solution (see SEMI Cl, Section 3.7, Flame Emission
Spectroscopy).
9 Grade 2 Procedures
9.1 This section does not apply to this chemical.
10 Grade 3 Procedures
10.1 This section does not apply to this chemical.
11 Grade 4 Procedures
11.1 This section does not apply to this chemical.
12 Grade 5 Procedures
12.1 This section does not apply to this chemical.
13 VLSI Grade Procedures
13.1 This section does not apply to this chemical.
14 Tier A Procedures
14.1 This section does not apply to this chemical.
SEMI C43-0699 © SEMI 19993
15 Tier B Procedures
15.1 This section does not apply to this chemical.
16 Tier C Procedures
16.1 This section does not apply to this chemical.
17 Tier D Procedures
17.1 This section does not apply to this chemical.
Table 1 Impurity Limits and Other Requirements for Sodium Hydroxide, 50% Solution
Previous SEMI Reference # --
Grade 1
(Specification)
Assay (NaOH) 50.0 - 52.0%
Ammonium Hydroxide
Precipitate
0.01% max
Insoluble Matter 50 ppm max
Nitrogen Compounds (as N) 5 ppm max
Chloride (Cl) 40 ppm max
Phosphate (PO
4
) 5 ppm max
Sodium Carbonate (Na
2
CO
3
)0.1% max
Sulfate (SO
4
) 10 ppm max
Heavy Metals (as Ag) 10 ppm max
Iron (Fe) 5 ppm max
Nickel (Ni) 5 ppm max
Potassium (K) 0.01% max
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer’s
instructions, product labels, product data sheets, and
other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SULFURIC ACID SEMI C44-0301 © SEMI 1978, 20011
SEMI C44-0301
SPECIFICATIONS AND GUIDELINES FOR SULFURIC ACID
These specifications and guidelines were technically approved by the Global Process Chemicals Committee
and are the direct responsibility of the North American Process Chemicals Committee. Current edition
approved by the North American Regional Standards Committee on October 17, 1999. Initially available at
www.semi.org February 2001; to be published March 2001. This document replaces SEMI C1.16, C7.8,
C8.8, and C11.5 in their entirety. Originally published in 1978, 1990, 1992, and 1994 respectively;
previously published October 2000.
1 Purpose
1.1 The purpose of this document is to standardize
requirements for sulfuric acid used in the
semiconductor industry and testing procedures to
support those standards. Test methods have been shown
to give statistically valid results. This document also
provides guidelines for grades of sulfuric acid for which
a need has been identified. In the case of the guidelines,
the test methods may not have been statistically
validated yet.
2 Scope
2.1 The scope of this document is all grades of sulfuric
acid used in the semiconductor industry.
2.2 The VLSI grade purity level is typically required
by semiconductor devices with geometries of 0.8–1.2
microns.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 None.
4 Referenced Standards
4.1 SEMI Standards
SEMI C1 — Specifications for Reagents
4.2 ASTM Standards
1
ASTM D5127 — Standard Guide for Ultra Pure Water
Used in the Electronics and Semiconductor Industry
NOTE 1: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
1 American Society for Testing and Materials, 100 Barr Harbor
Drive, West Conshohocken, Pennsylvania 19428-2959, USA.
Telephone: 610.832.9585, Fax: 610.832.9555. Website:
www.astm.org
5 Terminology
5.1 None.
6 Physical Property (for information only)
Density at 25°C
1.83 g/mL
7 Requirements
7.1 The requirements for sulfuric acid for Grades 1
and 2, VLSI Grade, and Tiers B and C are listed in
Table 1.
8 Grade 1 Procedures
NOTE 2: Each laboratory is responsible for verifying the
validity of the method within its own operation.
8.1 Assay — Accurately weigh 1 mL of sample in a
small glass-stoppered conical flask. Cautiously add 30
mL of water, cool, add 0.1 mL of methyl orange
indicator solution, and titrate with standardized 1.0 N
sodium hydroxide to a red to yellow color change.
%Assay
=
mL
×
N
of NaOH
×
4.904
Weight of sample g()
8.2 ColorDilute 2.0 mL of platinum-cobalt stock
solution (APHA No. 500) to 100 mL with water.
Compare this standard (APHA No. 10) with 100 mL of
sample in Nessler tubes. View vertically over a white
background. The sample must be no darker than the
standard.
8.3 Chloride — Place 40 mL of water in each of two
beakers. To one, add carefully 27 mL (50 g) of sample
and to the other, 27 mL (50 g) of chloride-free sulfuric
acid and 0.005 mg of chloride ion (Cl). Cool to room
temperature and add 1 mL of nitric acid and 1 mL of
silver nitrate reagent solution. Mix well; if necessary,
make the volume of each solution identical by adding
water. After 10 minutes, measure the turbidity of each
solution using a suitable nephelometer. The turbidity in
the sample should be no greater than the standard.
NOTE 3: Prepare chloride-free sulfuric acid in a hood by
gently fuming sulfuric acid in a crucible or dish for at least 30