semi合集-English.pdf - 第5640页

SEMI P10-0705 © SEMI 1990, 2005 135 8.1.465 OPERATOR_NAME — Alpha betic name of the perso n entering the mask orde r or entering the mask results. 8.1.466 OPTICAL_MASK_ID — For optical st epping or contact pri nting, the…

100%1 / 7923
SEMI P10-0705 © SEMI 1990, 2005 134
are limited to those defined under MILESTONE. MILESTONES may not be used in combination with
PERIODIC_UPDATES for the same MASK_ID.
8.1.448 MIN_CORNER_TO_CORNER_GAP — Smallest (scaled) corner-to-corner spacing of any features
included in any customer-supplied pattern data on the mask.
8.1.449 MIN_MASK_FEATURE_SIZE — Smallest (scaled) feature included in any customer-supplied pattern
data on the mask.
8.1.450 MINIMUM_FEATURE_LOCATION — Location of a minimally sized feature within the pattern file,
relative to the center of the pattern, unscaled and unmirrored.
8.1.451 MINIMUM_FEATURE_SIZE — Smallest (unscaled) feature included in pattern data, excluding OPC data
which is identified under OPC_MINIMUM_FEATURE_SIZE.
8.1.452 MIRROR — (HORIZONTAL or VERTICAL) Axis around which to invert the data image.
8.1.453 MIRROR_MASK — (T or F) All patterns and titles must be mirrored about the vertical axis, to be applied
in addition to all other positioning information.
8.1.454 MIRROR_PATTERN — (T or F) If T, the pattern file (or cell) is to be mirrored about its vertical axis. If
used in conjunction with MIRROR_MASK, the result will be unmirrored pattern data while all other data will be
mirrored.
8.1.455 MIRROR_TITLE — (T or F) If T, TITLE_TEXT is to be mirrored about the vertical axis. If used in
conjunction with MIRROR_MASK, result will be an unmirrored title with all other data mirrored (chrome side up).
8.1.456 MULTIWRITE — (x,y) If present as a mask option, then the MASK_ID represents only one writing
operation for a mask which requires multiple write and process cycles (defined within the <mask_group>) before the
final mask is completed. All MASK_IDs used to make the final mask must have MULTIWRITE as a
<mask_option> and must designate the same integer group number (x). Such a final mask will be built with a
specified integer sequence (y) of MASK_IDs. Sequence numbers may never be less than 1 nor more than the
number of write and process cycles specified in the order, except that zero may be used where the sequence is
arbitrary. A sequence number within a group may not be repeated (except zero).
8.1.457 MULTIWRITE_REF_MASK_ID — Within the MULTIWRITE numerical group, this is the MASK_ID to
which overlay error should be measured.
8.1.458 NUMBER_OF_CDS — The integer number of CD locations to be measured. If sufficient specific sites are
not explicitly identified by the customer, the vendor is free to select additional similar sites.
8.1.459 OPC_MINIMUM_FEATURE_SIZE — For the OPC_TYPE being described, the size of the smallest
(unscaled) OPC feature in the pattern data.
8.1.460 OPC_MINIMUM_GAP — For the OPC_TYPE being described, the size of the smallest (unscaled) gap in
the pattern data between OPC features of the same type.
8.1.461 OPC_PATTERN_MODIFIABLE — (T or F) If F, the pattern may not be modified (biased) by the mask
shop for printability or CD linearity improvement. In this case, the need for such biasing must have been anticipated
by the customer.
8.1.462 OPC_PATTERN_SEPARATE — (T or F) If T, then the pattern being described is only the OPC portion of
what will be written on the mask. Depending upon the write tool methodology, the pattern may need to be merged
off-line with other patterns. This may allow mask shop biasing for printability or CD linearity unless precluded by
OPC_PATTERN_MODIFIABLE = F.
8.1.463 OPC_TYPE — (CLEAR_SERIF, CLEAR_HAMMERHEAD, CLEAR_ASSIST_BAR, OPAQUE_SERIF,
OPAQUE_HAMMERHEAD, OPAQUE_ASSIST_BAR, JOG, PILLAR, HOLE) (Linewidth biasing is not included
as an OPC type.)
8.1.464 OPERATOR — (text) Mask supplier identification of employee who completed the photomask
requirements for the given operation.
SEMI P10-0705 © SEMI 1990, 2005 135
8.1.465 OPERATOR_NAME — Alphabetic name of the person entering the mask order or entering the mask
results.
8.1.466 OPTICAL_MASK_ID — For optical stepping or contact printing, the “pattern” is to be obtained by using a
reticle or mask built under this MASK_ID from the above-named MASK_SET_ID.
8.1.467 OPTICAL_MASK_SET_ID — For optical stepping or contact printing, the “pattern” is to be obtained by
using a reticle or mask from this MASK_SET_ID.
8.1.468 OPTICAL_MASK_TITLE — For optical stepping or contact printing, identifying title on reticle or mask.
To be used in place of OPTICAL_MASK_SET_ID and OPTICAL_-MASK_ID when the reticle or mask was built
without available <mask_order> data.
8.1.469 ORDER_ACCEPTED — Returns the exact FILE_DATE_TIME as in the file being accepted, thereby
agreeing to process the order as received.
8.1.470 ORDER_ID — Printable text of the customer’s internal order identification to provide correlation with pre-
existing order tracking systems. This is for customer cross-referencing only, but should be recorded by the vendor
and reported back in <mask_results>.
8.1.471 ORDER_RECEIVED — Returns the exact FILE_DATE_TIME as in the file being acknowledged, thereby
confirming receipt of that file. This response is required each time a new transmission is received by the vendor.
8.1.472 PACKAGE — Alphanumeric identification of brand and model of acceptable compact to be used for
delivering masks.
8.1.473 PACKAGE_USED — (text) The compact vendor’s part number of the compact in which the mask was
shipped and any additional compacts supplied.
8.1.474 PARAMETER_FILE_NAME REVISION — (text) Name of parameter file required by RUNSET_NAME.
Note that multiple run_set_name entries under a SOFTWARE_NAME means that multiple runs with the same
software are required.
8.1.475 PARAMETER_FILE_REVISION — (text) Revision identification of PARAMETER_FILE_NAME.
8.1.476 PATTERN_ADDRESS_SIZE — Address unit of the (unscaled) pattern file. If this is incorrect, the mask
will not be written until it is corrected. For data manipulation operations, this is the address to use in final fracturing
to produce a pattern file for exposure.
8.1.477 PATTERN_APPROVAL_REQD — name the pattern to be approved before the mask(s) may be written.
8.1.478 PATTERN_APPROVED — (date, name) Date approval was granted by customer and the name of the
pattern for PATTERN_APPROVAL_REQD.
8.1.479 PATTERN_CHARACTER_SET — (ASCII or EBCDID) ASCII is assumed unless otherwise specified.
8.1.480 PATTERN_FORMAT — (ALF, APPLICON, AUTOCAD, CATS_CFLT, CATS_CREF, CIF, DERIVED,
EEBES, ELECTROMASK, FALCON, GDS-II, HITACHI_700, HITACHI_800, JEOL_51, JEOL_52, KLARIS,
MANN_3000, MANN_3600, MEBES_I, MEBES_II, MEBES_EXTENDED, MEBES_RETICLE, MEBES_MODE
5, OASIS, ORBOT, ULTRABEAM, VSB11, ZBA, and others on request). Format of preceding pattern file. For
<data_manipulation> results, if multiple PATTERN_FORMATS are listed, they are in declining order of
preference. For BOOLEAN operations, DERIVED indicates DATA_SOURCE_FILE was the result of a previous
<data_manipulation> process.
8.1.481 PATTERN_FUNCTION — (FRAME, DEVICE, FIDUCIAL, BARCODE, TEST and others as needed by
the user) This keyword is for reference purposes only, with no action or requirement implied for the mask supplier.
It will serve merely to provide a functional name for customer convenience.
8.1.482 PATTERN_GENERATION_AREA — (x1,y1,x2,y2) Window in which to generate a digitized rectangle
for use in BOOLEAN operations, relative to the coordinate space of DATA_SOURCE_FILE.
8.1.483 PATTERN_GROUP_ID — Name of the pattern group which follows; must be used in all references within
this MASK_SET_ID to this pattern group.
SEMI P10-0705 © SEMI 1990, 2005 136
8.1.484 PATTERN_GROUP_INSTANCE — Identifies PATTERN_GROUP_ID to be placed by the following
location information.
8.1.485 PATTERN_NAME — Printable ASCII pattern file name. The file may be received intact, or may be
derived through data manipulation.
8.1.486 PATTERN_PLOT_APPR_REQD — (T or F) If T, customer approval of the pattern plot is required before
mask making is authorized.
8.1.487 PATTERN_PLOT_NORMAL_TONE — (T or F) If T, digitized data will be dark.
8.1.488 PATTERN_UNITS — (METRIC, ENGLISH) Units of preceding pattern file.
8.1.489 PATTERN_VISUAL_ID — Optional, printable text to specify identification within the pattern file which
must be visually confirmed as present before the mask may be written. If the feature is not present, the mask order
should go on hold.
8.1.490 PERCENT_CLEAR — Percentage of the patterned area which will become transparent after the mask is
processed. As a mask option it includes all the area within the scribe pattern limits. As a pattern option it includes
the area within the individual pattern limits.
8.1.491 PERCENT_CLEAR_REQUESTED — (T or F) If T, the vendor is requested to calculate, using available
CAD tools, the percentage of the patterned area on the mask which will become transparent after the mask is
processed, and transmit this value to the customer.
8.1.492 PERCENT_DEFECTIVE_DIE — Maximum percentage of defective die among those required by the
customer to meet defect criteria.
8.1.493 PERIODIC_UPDATE — notifies the customer that MASK_ID has passed the indicated processing step, or
is on hold.
8.1.494 PERIODIC_UPDATES — (integer) If non-zero, the vendor is requested to use <mask_results> (see §7.5)
to notify the customer on a periodic basis which significant processing step was last completed for MASK_ID. The
value of the data field indicates the number of hours between updates. Within this standard, these significant steps
are limited to those defined under MILESTONE. PERIODIC_UPDATES may not be used in combination with
MILESTONES for the same MASK_ID.
8.1.495 PHASE_ANGLE_EQUIP_REQD — (text) Phase angle measurement equipment required by customer.
8.1.496 PHASE_ANGLE_EQUIP_USED — (text) Phase angle measurement equipment used.
8.1.497 PHASE_ANGLE_ERROR — Maximum acceptable deviation (in degrees) of any phase shift measurement
from the PHASE_ANGLE_TARGET.
8.1.498 PHASE_ANGLE_MARK_DRAWING — The uniquely identified (for each customer) document which
shows the phase angle mark structure itself, and may show the place(s) within the phase angle mark which are to be
measured.
8.1.499 PHASE_ANGLE_MARK_FEATURE — Text describing the feature to be used for phase angle
measurement.
8.1.500 PHASE_ANGLE_MARK_LOCATION — (x,y) Location of phase angle mark relative to the nominal
center of the mask (chrome side up).
8.1.501 PHASE_ANGLE_MARK_LOCATION_DRAWING — The uniquely identified (for each customer)
document which shows the location(s) of the phase angle mark structure.
8.1.502
PHASE_ANGLE_MEASUREMENT_DATE — Phase angle measurement date.
8.1.503 PHASE_ANGLE_MEASUREMENT_FILE_NAME — Name of data file containing results of phase angle
measurement.
8.1.504 PHASE_ANGLE_MODE_REQD — (text) operating mode required by customer for
PHASE_ANGLE_EQUIP_USED.
8.1.505 PHASE_ANGLE_MODE_USED — (text) operating mode used on
PHASE_ANGLE_EQUIP_USED.