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SEMI P13-91 © SEMI 1991, 2004 1 SEMI P13-91 (Reapproved 1104) DETERMINATION OF SODIUM AN D POTASSIUM IN POSITIVE PHOTORESISTS BY ATOMIC AB SORPTION SPECTROSCOPY This standard was techn ically approved by the Global Micro…

SEMI P12-0997 © SEMI 1991, 1997 2
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer’s
instructions, product labels, product data sheets, and
other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.

SEMI P13-91 © SEMI 1991, 2004 1
SEMI P13-91 (Reapproved 1104)
DETERMINATION OF SODIUM AND POTASSIUM IN POSITIVE
PHOTORESISTS BY ATOMIC ABSORPTION SPECTROSCOPY
This standard was technically approved by the Global Micropatterning Committee and is the direct
responsibility of the North American Micropatterning Committee. Current edition approved by the North
American Regional Standards Committee on July 11, 2004. Initially available at www.semi.org September
2004; to be published November 2004. Originally published in 1991.
1 Scope
1.1 This procedure is a flame atomic absorption
analytical method for sodium and potassium analysis in
photoresist. The applicable concentration range is 0.1 to
1 ppm when the sample is diluted one to four. The
precision was found to be within 0.1 ppm in a round-
robin analysis between four laboratories.
NOTICE: This standard does not purport to address
safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory or other limitations prior
to use.
2 Referenced Standards
2.1 None.
3 Terminology
3.1.1 Detection Limit — the detection limit is a
function of the dilution factor and can vary by
instrument. The dilution factor should be taken into
account in calculation of detection limit.
4 Atomic Absorption Spectrometer
4.1 The analytical wavelength for sodium is 589.0 nm
and for potassium is 766.0 nm. The instrument
conditions (i.e., slit width, burner gas flow rates) should
be set according to the manufacturer’s manual (the fuel
flow should be set to approximately 1/2 the air flow to
optimize for organic solvent). Optimize the nebulizer
and lamp alignment to maximize the absorbance of the
1 ppm standard.
5 Sample Preparation
5.1 The sample should be diluted 1/4 (1 part resist and
3 parts of solvents weight/weight) in 2-methoxyethanol
or another suitable solvent for positive resist. The
solvent should contain less than 0.1 ppm of the element
being analyzed.
6 Standards
6.1 The standards should be weight/weight (mg/kg)
and should be diluted weight/weight since results will
be expressed in mg/kg.
6.2 The standards are prepared by diluting a
concentrated stock of organic-soluble sodium and
potassium. For example, a 500 ppm standard of sodium
is diluted to 50 ppm with reagent xylene. This solution
is then diluted to 1 ppm with 2-methoxyethanol or
another suitable solvent.
7 Procedure
7.1 Set the absorbance reading to zero with the flame
ignited and no sample aspirating. Measure the
absorbance of the solvent blank. It should not be more
than 0.04. Measure the absorbance of the 1 ppm
standard and samples. The absorbance of the standard
should be in the region of 0.4. Duplicate sample and
standard readings should be within 0.01 absorbance. A
recovery of 88% was determined when a 1 ppm
potassium internal standard was added to the resist
tested. The effect of viscosity on delivery to the burner
can be determined by adding 2 ppm of a potassium
internal standard to the sample and checking the
absorbance versus an external 2 ppm potassium
standard in the diluting solvent. The potassium level in
the resist, if any, should be subtracted.
8 Calculation
p
pm (mg/kg) =
Abs. Sample ppm Standard dilution factor R
Abs. Standard
R = Recovery factor due to sample viscosity if
applicable, for example 1.136 in above example.
Detection limit (ppm) = s × dilution factor where s =
standard deviation of instrument “readings” in ppm.

SEMI P13-91 © SEMI 1991, 2004 2
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer's instructions, product labels,
product data sheets, and other relevant literature,
respecting any materials or equipment mentioned
herein. These standards are subject to change without
notice.
By publication of this standard, Semiconductor
Equipment and Materials International (SEMI) takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any items
mentioned in this standard. Users of this standard are
expressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of
the contents in whole or in part is forbidden without express written
consent of SEMI.