semi合集-English.pdf - 第5642页

SEMI P10-0705 © SEMI 1990, 2005 137 8.1.506 PHASE_ANGLE_RANGE — Maximum acceptable variation (in degrees) of phase shift measurements, relative to each other. 8.1.507 PHASE_ANGLE_REFERENCE_ONLY — (T or F) If T, i ndicate…

100%1 / 7923
SEMI P10-0705 © SEMI 1990, 2005 136
8.1.484 PATTERN_GROUP_INSTANCE — Identifies PATTERN_GROUP_ID to be placed by the following
location information.
8.1.485 PATTERN_NAME — Printable ASCII pattern file name. The file may be received intact, or may be
derived through data manipulation.
8.1.486 PATTERN_PLOT_APPR_REQD — (T or F) If T, customer approval of the pattern plot is required before
mask making is authorized.
8.1.487 PATTERN_PLOT_NORMAL_TONE — (T or F) If T, digitized data will be dark.
8.1.488 PATTERN_UNITS — (METRIC, ENGLISH) Units of preceding pattern file.
8.1.489 PATTERN_VISUAL_ID — Optional, printable text to specify identification within the pattern file which
must be visually confirmed as present before the mask may be written. If the feature is not present, the mask order
should go on hold.
8.1.490 PERCENT_CLEAR — Percentage of the patterned area which will become transparent after the mask is
processed. As a mask option it includes all the area within the scribe pattern limits. As a pattern option it includes
the area within the individual pattern limits.
8.1.491 PERCENT_CLEAR_REQUESTED — (T or F) If T, the vendor is requested to calculate, using available
CAD tools, the percentage of the patterned area on the mask which will become transparent after the mask is
processed, and transmit this value to the customer.
8.1.492 PERCENT_DEFECTIVE_DIE — Maximum percentage of defective die among those required by the
customer to meet defect criteria.
8.1.493 PERIODIC_UPDATE — notifies the customer that MASK_ID has passed the indicated processing step, or
is on hold.
8.1.494 PERIODIC_UPDATES — (integer) If non-zero, the vendor is requested to use <mask_results> (see §7.5)
to notify the customer on a periodic basis which significant processing step was last completed for MASK_ID. The
value of the data field indicates the number of hours between updates. Within this standard, these significant steps
are limited to those defined under MILESTONE. PERIODIC_UPDATES may not be used in combination with
MILESTONES for the same MASK_ID.
8.1.495 PHASE_ANGLE_EQUIP_REQD — (text) Phase angle measurement equipment required by customer.
8.1.496 PHASE_ANGLE_EQUIP_USED — (text) Phase angle measurement equipment used.
8.1.497 PHASE_ANGLE_ERROR — Maximum acceptable deviation (in degrees) of any phase shift measurement
from the PHASE_ANGLE_TARGET.
8.1.498 PHASE_ANGLE_MARK_DRAWING — The uniquely identified (for each customer) document which
shows the phase angle mark structure itself, and may show the place(s) within the phase angle mark which are to be
measured.
8.1.499 PHASE_ANGLE_MARK_FEATURE — Text describing the feature to be used for phase angle
measurement.
8.1.500 PHASE_ANGLE_MARK_LOCATION — (x,y) Location of phase angle mark relative to the nominal
center of the mask (chrome side up).
8.1.501 PHASE_ANGLE_MARK_LOCATION_DRAWING — The uniquely identified (for each customer)
document which shows the location(s) of the phase angle mark structure.
8.1.502
PHASE_ANGLE_MEASUREMENT_DATE — Phase angle measurement date.
8.1.503 PHASE_ANGLE_MEASUREMENT_FILE_NAME — Name of data file containing results of phase angle
measurement.
8.1.504 PHASE_ANGLE_MODE_REQD — (text) operating mode required by customer for
PHASE_ANGLE_EQUIP_USED.
8.1.505 PHASE_ANGLE_MODE_USED — (text) operating mode used on
PHASE_ANGLE_EQUIP_USED.
SEMI P10-0705 © SEMI 1990, 2005 137
8.1.506 PHASE_ANGLE_RANGE — Maximum acceptable variation (in degrees) of phase shift measurements,
relative to each other.
8.1.507 PHASE_ANGLE_REFERENCE_ONLY — (T or F) If T, indicates that the phase angle feature is to be
measured and the data transmitted to the customer (if requested by SHIP_PHASE_SHIFT_MEASUREMENTS), but
that deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.508 PHASE_ANGLE_SITE_ID — Unique alphanumeric identifier of each phase angle measurement location
within MASK_SET_ID to identify individual locations when using <mask_results>. If the same coordinates apply
to locations on different masks within the mask set, they may have the same PHASE_ANGLE_SITE_ID, but it is
not mandatory.
8.1.509 PHASE_ANGLE_TARGET — The required phase shift in degrees at the specified PSM_WAVELENGTH.
8.1.510 PHASE_ANGLE_TOLERANCE — The maximum acceptable deviation of the mean of all phase shift
measurements (in degrees) to the PHASE_ANGLE_TARGET.
8.1.511 PHASE_SHIFT_QUALITY_ID — (text) Customer’s label for a collection of phase shift quality
specifications, to be used only in addition to explicit quality requirement keywords. This may be used in the data
structure in addition to, but not in place of, explicit quality requirement keywords. This may not be used in
combination with QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality
grade before using it in SEMI P10.
8.1.512 PLACEMENT_TOP_CELL — Name of CELL_ID which defines all pattern place-ments for this
MASK_GROUP_ID. This referenced cell is centered on the mask.
8.1.513 PLOT_FORMAT — (GIF, JPG, PNG, FAX, PAPER) Medium for delivery of plot.
8.1.514 PLOT_SCALE — Numeric scale of plot or map.
8.1.515 PLOT_TYPE — (JOB_DATA, ARRAY, PATTERN, BARCODE) Requires delivery of the plot to the
customer. JOB_DATA requires delivering a plot of the entire patterned area of the mask, including the image of the
pattern file data. ARRAY requires an array map to be sent showing only an outline of each pattern and not showing
the image content of any pattern. PATTERN requires delivering a plot of the pattern at the scale and tone indicated.
BARCODE requires delivering a plot of the pattern created by <barcode_data>. PATTERN is the only value
permitted under <pattern_options>. The other types are permitted only under <shippable_data>.
8.1.516 PO_NUMBER — Alphanumeric purchase order number.
8.1.517 POST_PELL_INSPECTION_DATE_AND_TIME — Date and time of the final qualifying inspection run
after applying the pellicle.
8.1.518 POST_PELL_INSPECTION_ID — Identification (or serial number) assigned by the inspection tool for the
final qualifying inspection run after applying the pellicle.
8.1.519 PRE_PELL_INSPECTION_DATE_AND_TIME — Date and time of the final qualifying inspection run
prior to applying the pellicle.
8.1.520 PRE_PELL_INSPECTION_ID — Identification (or serial number) assigned by the inspection tool for the
final qualifying inspection run prior to applying the pellicle.
8.1.521 PRICE — Price (excluding freight and taxes) for preceding item (e.g., mask, pellicle, plot, database
inspection).
8.1.522 PRICE_UNITS — (3-character alphabetic currency code as listed in ISO 4217) Monetary unit used in all
references to PRICE with the <mask_set>.
8.1.523 PROCESS — (text) Name of the special process to be used in making the masks.
8.1.524 PROCESS_ETCHING_TYPE — (DRY or WET) Etching process to be used in making the masks.
8.1.525 PRODUCT_AS_CHECKPLATE — (T or F) If T, product mask is to be used for check-plate approval prior
to making other product masks.
SEMI P10-0705 © SEMI 1990, 2005 138
8.1.526 PRODUCT_IMAGING_TYPE — (BINARY, AAPSM, EAPSM, COMPLIMENTARY, BINARY_TRIM,
or EUV)
8.1.527 PRODUCT_MAGNIFICATION — (10X, 5X, 4X, 2.5X, 2X, 1.25X, 1X, 0.8X) Factor by which the
exposure tool will reduce the image on the photomask (reticle) to form the image on the wafer.
8.1.528 PRODUCT_TYPE — (1X_FULL_FIELD, 1X_STD_FIELD_RETICLE, 1X_WIDE_FIELD_RETICLE,
RETICLE, CONTACT, SUBMASTER, CHECKPLATE, PROBE_PLATE, REPELLICLIZE and REINSPECT).
8.1.529 PSM_WAVELENGTH — Wavelength in nanometers to be used for <phase_shift> measurements. This
keyword may appear in addition to AIM_WAVELENGTH for a single MASK_ID, though the values of the two
should usually be the same.
8.1.530 PTC_FIXED — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value is expressed as a fixed monetary amount and is mutually exclusive with
PTC_RATE.
8.1.531 PTC_HOURS — (numeric) The number of hours from a given mask’s start date time (as negotiated
between the customer and vendor) within which the mask must be shipped to qualify for the Premium Time Charge
(PTC) specified in either PTC_RATE or PTC_FIXED. Multiple instances allow configuration of different charge
rates for different levels of performance, for example: 100 % for 12 hr turn, 75 % for 18 hr turn, 50 % for 24 hr turn.
8.1.532 PTC_RATE — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value represents the percentage of the total mask price (excluding
EWT_THRESHOLD hours) and is mutually exclusive with PTC_FIXED.
8.1.533 QS9000 — (T or F) If T, requires QS9000 control. Customer and vendor should agree on the methods and
control details before using this item.
8.1.534 QUALITY_GROUP_ID — (text) Customer’s label for a collection of mask quality specifications, to be
used only in addition to explicit quality requirement keywords. This may be used in the data structure in addition to,
but not in place of, explicit quality requirement keywords. Customer and vendor should document the meaning of
this quality grade before using it in SEMI P10.
8.1.535 QUANTITY — Integer number of array plots, pattern plots and films. May also apply to masks only when
PRODUCT_TYPE is contact masks.
8.1.536 QUOTE_NUMBER — Vendor’s quotation number to be referenced in billing documents.
8.1.537 REGISTR_ALGORITHM — (ONE-POINT, TWO-POINT or MULTI-POINT, x1,y1,x2,y2) Specifies the
method for analyzing registration reference marks. For ONE-POINT analysis, (x1,y1) is the fixed point and (x2,y2)
is used for angular orientation only. For TWO-POINT analysis, (x1,y1) and (x2,y2) are both used for angular
orientation and the fixed reference point is midway between the two. If MULTI-POINT is followed in the data field
by no specific points, then MULTI-POINT is the fit of all measured points resulting in zero mean error in x and zero
mean error in y. If MULTI-POINT is followed in the data field by a collection of three or more specific points, then
MULTI-POINT is the fit of all the specific points resulting in zero mean error in x and zero mean error in y for those
points. All of these points are relative to the nominal center of the mask.
8.1.538 REGISTR_ALGORITHM_USED — The method used for analyzing registration reference marks in the
registration measurements.
8.1.539 REGISTR_CLOSURE — Maximum allowable positional error between patterns written at the beginning of
writing the mask and the end of writing the mask, to be measured in both x and y axes.
8.1.540 REGISTR_CLOSURE_BEGIN — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the
beginning of writing the mask for REGISTR_CLOSURE measurement.
8.1.541 REGISTR_CLOSURE_END — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the end
of writing the mask for REGISTR_CLOSURE measurement.
8.1.542 REGISTR_CLOSURE_EQUIP_REQD — Alphanumeric identification of acceptable equipment for closure
measurement.
8.1.543 REGISTR_CLOSURE_EQUIP_USED — Closure measurement equipment used.